Effect of annealing and UV-radiation time over micropore architecture of self-assembled block copolymer thin film

Nanostructured thin film organic radical cathodes have been prepared from poly(styrene)-block-poly(2,2,6,6-tetramethylpiperidinyloxy-4-yl methacrylate) diblock copolymers.

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SELF-CLEANING GLASS BASED ON ACID-TREATED TiO2 FILMS WITH PALMITIC ACID AS MODEL POLLUTANT

Indonesian Journal of Chemistry ◽

10.22146/ijc.21623 ◽

2010 ◽

Vol 8 (2) ◽

pp. 200-206

Author(s):

Nurul Hidayat Aprilita ◽

Indriana Kartini ◽

Sofy Herawati Ratnaningtyas

Keyword(s):

Thin Film ◽

Photocatalytic Activity ◽

Palmitic Acid ◽

Uv Radiation ◽

Acid Treatment ◽

Tio2 Films ◽

Sem Images ◽

Self Cleaning ◽

Radiation Time

Preparation and characterization of self-cleaning glass based on acid-treated TiO2 films as well as evaluation on their self-cleaning properties have been carried out. Palmitic acid photodegradation was used as model pollutant. Acid-treated TiO2 powders were deposited on glass surface by using spraying technique. The XRD results showed that acid-treated TiO2 film exhibited decreased anatase crystalline size. The corresponding SEM images showed porous surface morphology. Layer densification was observed as the film thickness increased. TiO2 photocatalytic activity increased as the length of UV radiation increased. Best results were obtained at experimental condition of 35 hours UV radiation time. It is also observed that the thickness of TiO2 layers influenced the efficiency of palmitic acid photodegradation. The film with 1.661 µm thick TiO2 layers and 6.933 mg weight (0.7164 mg/cm2) could degrade 97.54 % mg palmitic acid/cm2 thin film. Keywords: TiO2 films, acid treatment, self-cleaning glass

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Self assembled block copolymer gate insulators with cylindrical nanostructures for pentacene thin film transistor

Macromolecular Research ◽

10.1007/s13233-010-0805-5 ◽

2010 ◽

Vol 18 (8) ◽

pp. 777-786 ◽

Cited By ~ 9

Author(s):

Pil Sung Jo ◽

Youn Jung Park ◽

Seok Ju Kang ◽

Tae Hee Kim ◽

Cheolmin Park ◽

...

Keyword(s):

Thin Film ◽

Block Copolymer ◽

Thin Film Transistor ◽

Gate Insulators ◽

Self Assembled

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SrTiO3 Functional Ceramics Thin Film Prepared by Self-Assembled Monolayers with PTCS Substrate Functionalization

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.105-106.297 ◽

2010 ◽

Vol 105-106 ◽

pp. 297-300

Author(s):

Bo Qin ◽

Guo Qiang Tan ◽

Hong Yan Miao ◽

Jian Liu ◽

Ao Xia ◽

...

Keyword(s):

Thin Film ◽

Uv Radiation ◽

Colloidal Particles ◽

Film Surface ◽

The Self ◽

Self Assembled Monolayers ◽

Supersaturated Solution ◽

Thin Film Surface ◽

Assembled Monolayers ◽

Self Assembled

This article used PTCS to dispose the self-assembled substrate, and prepared the precursor by the ratio of AHFT / SN / BA = 1:1:3 and then immersed the functionalized substrate into the precursor supersaturated solution. With the colloidal particles absorption induced by SAMs, SrTiO3 thin film was prepared by the self-assembled monolayers with liquid phase deposition method. The effects of the time of UV radiation and the time of PTCS immersion on the substrate contact angle were studied and the time of UV radiation had an effect on the substrate functionalization after PTCS immersion. The results showed that the first UV radiation for 25 min, PTCS immersion for 7 min and the second UV radiation for 30 min were beneficial to the crystallization of SrTiO3. XRD and AFM were used to characterize the thin film physical phase and surface morphology at 600oCwith annealing and heat retaining for 2 hours. The results also showed that under the same condition, the SrTiO3 crystals on the thin film surface had the clear outline and the spherical crystals were distributed regularly and evenly.

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Fabrication of Nanostructure and Formation of Nanocrystal for Non-Volatile Memory

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2006.075 ◽

2006 ◽

Vol 6 (11) ◽

pp. 3652-3656 ◽

Cited By ~ 4

Author(s):

Sungwook Jung ◽

I. O. Parm ◽

Kyung Soo Jang ◽

Dae-Ho Park ◽

Byeong-Hyeok Sohn ◽

...

Keyword(s):

Thin Film ◽

Block Copolymer ◽

Memory Device ◽

Critical Dimensions ◽

Planar Structures ◽

Non Volatile Memory ◽

Needle Structure ◽

Volatile Memory ◽

Self Assembled ◽

Surface Morphologies

In this work, we have demonstrated that the nanocrystal created by combining the self-assembled block copolymer thin film with regular semiconductor processing can be applicable to non-volatile memory device with increased charge storage capacity over planar structures. Self-assembled block copolymer thin film for nanostructures with critical dimensions below photolithographic resolution limits has been used during all experiments. Nanoporous thin film from PS-b-PMMA diblock copolymer thin film with selective removal of PMMA domains was used to fabricate nanostructure and nanocrystal. We have also reported about surface morphologies and electrical properties of the nano-needle structure formed by RIE technique. The details of nanoscale pattern of the very uniform arrays using RIE are presented. We fabricated different surface structure of nanoscale using block copolymer. We also deposited Si-rich SiNx layer using ICP-CVD on the silicon surface of nanostructure. The deposited films were studied after annealing. PL studies demonstrated nanocrystal in Si-rich SiNx film on nanostructure of silicon.

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