NEGATIVE PHOTORESISTS ON THE BASIS OF COPOLYMERS OF 2-CHLOROMETHYL-1-(PVINYL PHENYL)CYCLOPROPANE WITH GLYCIDYL METHACRYLATE
Keyword(s):
The radical copolymerization of 2-chloromethyl-1-(p-vinyl phenyl)cyclopropane with glycidyl methacrylate is carried out. The composition and structure of the obtained copolymer are established. The constant values of relative activity of monomers are determined and Q-е parameters on Alfrey-Price are calculated. The photosensitivity of new cyclopropane and epoxy-containing photosensitive copolymers is studied. The photochemical structuring is investigated and it is established that the synthesized polymer has a photosensitivity (56 cm2/J) and can be used for creation of photosensitive material.
2011 ◽
Vol 53
(5-6)
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pp. 278-282
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2011 ◽
Vol 124
(3)
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pp. 2209-2215
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2019 ◽
Vol 41
(12)
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pp. 1768-1776
1995 ◽
Vol 7
(4)
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pp. 503-515
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2009 ◽
Vol 47
(23)
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pp. 6526-6533
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2008 ◽
Vol 44
(9)
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pp. 2920-2926
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