Fabrication and Properties of AlN Film on GaN Substrate by Using Remote Plasma Atomic Layer Deposition Method

2009 ◽  
Vol 5 (2) ◽  
pp. 83-86 ◽  
Author(s):  
Kwang-Ho Kim ◽  
No-Won Kwak ◽  
Soo Hong Lee
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Method ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method ◽  
Aln Film

Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method

2005 ◽  
Vol 87 (26) ◽  
pp. 262901 ◽  
Author(s):  
Youngdo Won ◽  
Sangwook Park ◽  
Jaehyoung Koo ◽  
Seokhoon Kim ◽  
Jinwoo Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Atomic Layer ◽  
Initial Reaction ◽  
Deposition Method ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method

Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate

2019 ◽  
Vol 1 (5) ◽  
pp. 459-464
Author(s):  
Hyunseok Kang ◽  
Seokhoon Kim ◽  
Jinwoo Kim ◽  
Jihoon Choi ◽  
Hyeongtag Jeon ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Method ◽  
Si Substrate ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method
Sign in / Sign up

Export Citation Format

Share Document