Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method

2003 ◽  
Vol 42 (Part 2, No. 4B) ◽  
pp. L414-L416 ◽  
Author(s):  
Ju Youn Kim ◽  
Yangdo Kim ◽  
Hyeongtag Jeon
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Method ◽  
Remote Plasma ◽  
Tin Films ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method

Initial reaction of hafnium oxide deposited by remote plasma atomic layer deposition method

2005 ◽  
Vol 87 (26) ◽  
pp. 262901 ◽  
Author(s):  
Youngdo Won ◽  
Sangwook Park ◽  
Jaehyoung Koo ◽  
Seokhoon Kim ◽  
Jinwoo Kim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Hafnium Oxide ◽  
Atomic Layer ◽  
Initial Reaction ◽  
Deposition Method ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method

Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate

2019 ◽  
Vol 1 (5) ◽  
pp. 459-464
Author(s):  
Hyunseok Kang ◽  
Seokhoon Kim ◽  
Jinwoo Kim ◽  
Jihoon Choi ◽  
Hyeongtag Jeon ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Method ◽  
Si Substrate ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Atomic Layer Deposition Method
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