HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method

ECS Transactions ◽

10.1149/1.2721477 ◽

2019 ◽

Vol 3 (15) ◽

pp. 89-98

Author(s):

Seokhoon Kim ◽

Hyeongtag Jeon

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Method ◽

Remote Plasma ◽

Layer Deposition ◽

Atomic Layer Deposition Method

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Cobalt Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method Using C12H10O6(Co)2 and CpCo(CO)2

Solid State Phenomena - Advances in Nanomaterials and Processing ◽

10.4028/3-908451-31-0.359 ◽

2007 ◽

pp. 359-362

Author(s):

Keun Woo Lee ◽

Keun Jun Kim ◽

Woo Ho Jeong ◽

Tae Yong Park ◽

Hyeong Tag Jeon

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Method ◽

Remote Plasma ◽

Layer Deposition ◽

Atomic Layer Deposition Method ◽

Cobalt Thin Film

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HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method

ECS Meeting Abstracts ◽

10.1149/ma2006-02/21/1050 ◽

2006 ◽

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Method ◽

Remote Plasma ◽

Layer Deposition ◽

Atomic Layer Deposition Method

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Characteristics of TiN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.l414 ◽

2003 ◽

Vol 42 (Part 2, No. 4B) ◽

pp. L414-L416 ◽

Author(s):

Ju Youn Kim ◽

Yangdo Kim ◽

Hyeongtag Jeon

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Method ◽

Remote Plasma ◽

Tin Films ◽

Layer Deposition ◽

Atomic Layer Deposition Method

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Characteristics of the HfO2 Thin Films Grown by Remote Plasma Atomic Layer Deposition Method on the Plasma Oxidized Si Substrate

ECS Meeting Abstracts ◽

10.1149/ma2005-02/13/536 ◽

2005 ◽

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Method ◽

Si Substrate ◽

Remote Plasma ◽

Layer Deposition ◽

Atomic Layer Deposition Method

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Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Journal of Membrane Science ◽

10.1016/j.memsci.2013.09.005 ◽

2014 ◽

Vol 450 ◽

pp. 174-180 ◽

Author(s):

Juha Nikkola ◽

Jenni Sievänen ◽

Mari Raulio ◽

Jing Wei ◽

Jyrki Vuorinen ◽

...

Keyword(s):

Thin Film ◽

Surface Modification ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Method ◽

Film Composite ◽

Thin Film Composite ◽

Layer Deposition ◽

Atomic Layer Deposition Method ◽

Polyamide Membrane

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Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)2] and Dicobalt Octacarbonyl [Co2(CO)8]

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.l173 ◽

2007 ◽

Vol 46 (No. 8) ◽

pp. L173-L176 ◽

Author(s):

Keunjun Kim ◽

Keunwoo Lee ◽

Sejin Han ◽

Taeyong Park ◽

Youngjin Lee ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Method ◽

Remote Plasma ◽

Dicobalt Octacarbonyl ◽

Layer Deposition ◽

Atomic Layer Deposition Method

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Scratch Behavior of ZrO2 Thin Film Prepared by Atomic Layer Deposition Method on Silicon Wafer

Journal of Friction and Wear ◽

10.3103/s1068366617060071 ◽

2017 ◽

Vol 38 (6) ◽

pp. 469-476

Author(s):

Si Hwan Kim ◽

Byung Chan Yang ◽

Jihwan An ◽

Hyo Sok Ahn

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Silicon Wafer ◽

Atomic Layer ◽

Deposition Method ◽

Zro2 Thin Film ◽

Layer Deposition ◽

Atomic Layer Deposition Method ◽

Scratch Behavior

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Recent Progress on Metal Oxide Semiconductor Thin Film Transistor Application via Atomic Layer Deposition Method

TMS 2019 148th Annual Meeting & Exhibition Supplemental Proceedings - The Minerals, Metals & Materials Series ◽

10.1007/978-3-030-05861-6_10 ◽

2019 ◽

pp. 115-120

Author(s):

Jiazhen Sheng ◽

Jung-Hoon Lee ◽

Tae-Hyun Hong ◽

Wan-Ho Choi ◽

Jin-Seong Park

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Recent Progress ◽

Thin Film Transistor ◽

Atomic Layer ◽

Oxide Semiconductor ◽

Deposition Method ◽

Layer Deposition ◽

Atomic Layer Deposition Method ◽

Semiconductor Thin Film

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Barrier Characteristics of HfN Films Deposited by Using the Remote Plasma-Enhanced Atomic Layer Deposition Method

ECS Meeting Abstracts ◽

10.1149/ma2006-02/21/1057 ◽

2006 ◽

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Deposition Method ◽

Remote Plasma ◽

Layer Deposition ◽

Atomic Layer Deposition Method

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Vertical Channel ZnO Thin-Film Transistors Using an Atomic Layer Deposition Method

IEEE Electron Device Letters ◽

10.1109/led.2013.2296604 ◽

2014 ◽

Vol 35 (3) ◽

pp. 360-362 ◽

Author(s):

Chi-Sun Hwang ◽

Sang-Hee Ko Park ◽

Himchan Oh ◽

Min-Ki Ryu ◽

Kyoung-Ik Cho ◽

...

Keyword(s):

Thin Film ◽

Atomic Layer Deposition ◽

Thin Film Transistors ◽

Vertical Channel ◽

Atomic Layer ◽

Zno Thin Film ◽

Deposition Method ◽

Layer Deposition ◽

Atomic Layer Deposition Method

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