scholarly journals Grain Size and Phase Transformation Behavior of TiNi Shape-Memory-Alloy Thin Film under Different Deposition Conditions

Materials ◽  
2020 ◽  
Vol 13 (14) ◽  
pp. 3229
Author(s):  
Joohyeon Bae ◽  
Hyunsuk Lee ◽  
Duckhyeon Seo ◽  
Sangdu Yun ◽  
Jeonghyeon Yang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Shape Memory Alloy ◽  
Substrate Temperature ◽  
Shape Memory ◽  
High Speed ◽  
Alloy Thin Film ◽  
Bulk Alloys ◽  
Deposition Conditions

TiNi shape-memory-alloy thin films can be used as small high-speed actuators or sensors because they exhibit a rapid response rate. In recent years, the transformation temperature of these films, manufactured via a magnetron sputtering method, was found to be lower than that of the bulk alloys owing to the small size of the grain. In this study, deposition conditions (growth rate, film thickness, and substrate temperature) affecting the grain size of thin films were investigated. The grain size of the thin film alloys was found to be most responsive to the substrate temperature.

Extremely high pitting resistance of NiTi shape memory alloy thin film in simulated body fluids

2008 ◽  
Vol 62 (17-18) ◽  
pp. 2791-2794 ◽  
Author(s):  
T. Shahrabi ◽  
S. Sanjabi ◽  
E. Saebnoori ◽  
Z.H. Barber
Keyword(s):  
Thin Film ◽  
Shape Memory Alloy ◽  
Shape Memory ◽  
Body Fluids ◽  
Niti Shape Memory Alloy ◽  
Alloy Thin Film ◽  
Simulated Body Fluids

The Response Characteristics of Ni-Ti Shape Memory Alloy Thin Film

2003 ◽  
Vol 2003.41 (0) ◽  
pp. 45-46
Author(s):  
Tomotaka HONDA ◽  
Hitoshi TAKAGI ◽  
Hiroaki MISAWA ◽  
Toyokazu KUBO
Keyword(s):  
Thin Film ◽  
Shape Memory Alloy ◽  
Shape Memory ◽  
Alloy Thin Film ◽  
Response Characteristics

The Response Behavior of Ni-Ti Shape Memory Alloy Thin Film

2003 ◽  
Vol 2003.1 (0) ◽  
pp. 261-262
Author(s):  
Hitoshi TAKAGI ◽  
Tomotaka HONDA ◽  
Hiroaki MISAWA
Keyword(s):  
Thin Film ◽  
Shape Memory Alloy ◽  
Shape Memory ◽  
Alloy Thin Film ◽  
Response Behavior

Fabrication of TiNi shape memory alloy thin films by pulsed-laser deposition

2002 ◽  
Vol 17 (2) ◽  
pp. 279-283 ◽  
Author(s):  
X. Y. Chen ◽  
Y. F. Lu ◽  
Z. M. Ren ◽  
S. Zhu
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Substrate Temperature ◽  
Shape Memory ◽  
Pulsed Laser Deposition ◽  
Deposition Rate ◽  
Crystallization Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Composition Control

Thin films of TiNi shape memory alloy have been prepared by pulsed-laser deposition at different substrate temperatures. The stoichiometry and crystallinity of the deposited films as functions of the substrate temperature were investigated. The deposition rate, surface morphology, crystallization temperature, and phase transformation behavior of the films were studied. It was found that both the substrate temperature and the laser fluence play important roles in the composition control and crystallization of the films. The deposition rate is of the order of 10−2 nm/pulse. The Ni content ranges from 46.7 to 52.0 at.%. The crystallization temperature of the amorphous Ti–51.5 at.% Ni films is around 460 °C. The activation energy of the crystallization process was determined by Kissinger's method to be 301 kJ/mol. The martensitic transformation temperature of the annealed Ti–51.5 at.% Ni film was determined to be −20.8 °C.

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