Numerical Analysis of SPP Maskless Interference Lithography System

2012 ◽  
Vol 41 (5) ◽  
pp. 558-564
Author(s):  
董启明 DONG Qiming ◽  
郭小伟 GUO Xiaowei
Keyword(s):  
Numerical Analysis ◽  
Interference Lithography ◽  
Lithography System

Effect of Measured Interference Fringe Period Error on Groove Profile of Grating Masks in Scanning Beam Interference Lithography System

2014 ◽  
Vol 34 (4) ◽  
pp. 0405003 ◽  
Author(s):  
姜珊 Jiang Shan ◽  
巴音贺希格 Bayanheshig ◽  
宋莹 Song Ying ◽  
潘明忠 Pan Mingzhong ◽  
李文昊 Li Wenhao
Keyword(s):  
Interference Fringe ◽  
Interference Lithography ◽  
Scanning Beam ◽  
Groove Profile ◽  
Scanning Beam Interference Lithography ◽  
Lithography System

Tunable Lloyd-Mirror Interferometer for Large-Area Nanopatterning

2009 ◽  
Author(s):  
Ishan Wathuthanthri ◽  
Chang-Hwan Choi
Keyword(s):  
Interference Lithography ◽  
Large Area ◽  
Independent Control ◽  
Fixed Angle ◽  
Lithography System

This paper reports on a new Lloyd-mirror interference lithography system whose mirror angle is variable with respect to the substrate. We demonstrate that this tunable Lloyd-mirror interferometer significantly increases the nanopatterning area with greater controllability compared to a conventional fixed-angle system for pattern periodicity over 500 nm. The new configuration capable of the independent control of mirror angle will enhance the advantages of Lloyd-mirror interferometer for large-area nanopatterning with more flexibility.

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