Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition
2007 ◽
Vol 4
(S1)
◽
pp. S210-S214
◽
Keyword(s):
2017 ◽
Vol 721
◽
pp. 70-79
◽
1995 ◽
Vol 14
(24)
◽
pp. 1757-1760
◽
2004 ◽
Vol 180-181
◽
pp. 244-249
◽
Keyword(s):
2007 ◽
Vol 9
(4)
◽
pp. 444-447
◽
2000 ◽
Vol 125
(1-3)
◽
pp. 301-307
◽