Advances in Structural Characterization of Thin Film Nanocrystalline Silicon for Photovoltaic Applications

2007 ◽  
pp. 33-38
Author(s):  
Alessia Le Donne ◽  
Simona Binetti ◽  
Giovanni Isella ◽  
Bernard Pichaud ◽  
Michael Texier ◽  
...  
Keyword(s):  
Thin Film ◽  
Structural Characterization ◽  
Nanocrystalline Silicon ◽  
Photovoltaic Applications

Deposition and characterization of nanostructured Cu2O thin-film for potential photovoltaic applications

2013 ◽  
Vol 28 (13) ◽  
pp. 1740-1746 ◽  
Author(s):  
Nishant Gupta ◽  
Rajendra Singh ◽  
Fan Wu ◽  
Jagdish Narayan ◽  
Colin McMillen ◽  
...  
Keyword(s):  
Thin Film ◽  
Photovoltaic Applications ◽  
Cu2o Thin Film ◽  
Image Position

Abstract

Characterization of nano-powder grown ultra-thin film p-CuO/n-Si hetero-junctions by employing vapour-liquid-solid method for photovoltaic applications

2016 ◽  
Vol 612 ◽  
pp. 331-336 ◽  
Author(s):  
Jenifar Sultana ◽  
Anindita Das ◽  
Avishek Das ◽  
Nayan Ranjan Saha ◽  
Anupam Karmakar ◽  
...  
Keyword(s):  
Thin Film ◽  
Nano Powder ◽  
Photovoltaic Applications ◽  
Ultra Thin Film

Magnetic and structural characterization of Ni(1−x)Gex thin film

2015 ◽  
Vol 373 ◽  
pp. 164-168 ◽  
Author(s):  
S. Kazan ◽  
B. Kocaman ◽  
A. Parabaş ◽  
F. Yıldız ◽  
B. Aktaş
Keyword(s):  
Thin Film ◽  
Structural Characterization

scholarly journals Structural Characterization of (Re)Bco Layer Deposited by Pld and Mocvd Techniques

2014 ◽  
Vol 22 (341) ◽  
pp. 137-142
Author(s):  
Jozef Mišík ◽  
Marcela Pekarčíková ◽  
Jozef Janovec
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Structural Characterization ◽  
Structural Defects ◽  
Chemical Heterogeneity ◽  
Edx Analysis

Abstract (RE)BCO thin films prepared by PLD and MOCVD techniques were investigated to characterize structural defects - outgrowths in thin film. For this purpose SEM, EDX analysis and LSCM were used. Outgrowths are often penetrating into the thin films. Evident differences in chemical heterogeneity, outgrowth morphology and outgrowths density between PLD and MOCVD thin films were proven in this study.

The Characterization of Bottom-gate Thin Film Transistors adapted Nanocrystalline Silicon as Active Layer by Catalytic CVD at Low Temperature

2019 ◽  
Vol 25 (3) ◽  
pp. 259-262
Author(s):  
Youn-Jin Lee ◽  
Kyoung-Min Lee ◽  
Jae-Dam Hwang ◽  
Kil-Sun No ◽  
Kap Soo Yoon ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Active Layer ◽  
Thin Film Transistors ◽  
Nanocrystalline Silicon ◽  
Bottom Gate ◽  
Catalytic Cvd
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