Changing Direction Parallel Scan Path Generating Method through Matching Scan Space for Metal Laser Deposition Shaping

2012 ◽  
Vol 159 ◽  
pp. 79-83
Author(s):  
Hong You Bian ◽  
Guang Yang ◽  
Gang Wang ◽  
Lan Yun Qin ◽  
Wei Wang ◽  
...  
Keyword(s):  
Laser Deposition ◽  
Practical Application ◽  
Direction Parallel ◽  
Generating Method ◽  
Scan Path ◽  
Parallel Scan

Those ultimate reasons of over-cladding and under-cladding are indicated through analyzing between the existing parallel scan mode and the characteristic of metal laser deposition shaping. A kind of scan path generating method is presented, firstly, scan path is generated base on grouping internal parallel filling scan according to the set scan space in the same layer, then, scan direction is changed base on matching different scan space in different layer. Practical application shows that the scan path can effectively enhance the flatness of shaping layer and the fabrication quality, ensure to shape successfully.

Grouping Parallel Filling Scan Path Generating Algorithm of Metal Laser Deposition Shaping

2012 ◽  
Vol 472-475 ◽  
pp. 2484-2488
Author(s):  
Hong You Bian ◽  
Guang Yang ◽  
Gang Wang ◽  
Lan Yun Qin ◽  
Wei Wang ◽  
...  
Keyword(s):  
Laser Deposition ◽  
Practical Application ◽  
End Point ◽  
Scan Path ◽  
Characteristic Points ◽  
Scan Line ◽  
Parallel Scan ◽  
Filling Line

Those ultimate reasons of over-cladding and under-cladding are indicated through analyzing between the existing parallel scan mode and the characteristic of metal laser deposition shaping. A kind of scan path generating algorithm is presented based on only parallel filling scan, firstly, increasing scan line based on recognizing characteristic points is adopted which generate the scan filling line according to the set scan space; then, scan path is generated through grouping and optimizing to connect filling lines based on judging the distance of between the end point of last vector and the start point of next vector. Practical application shows that the scan path can effectively enhance the flatness of shaping layer and the fabrication quality, ensure to shape successfully.

scholarly journals Use of Data Mining Techniques for the Prediction of Surface Roughness of Printed Parts in Polylactic Acid (PLA) by Fused Deposition Modeling (FDM): A Practical Application in Frame Glasses Manufacturing

Polymers ◽  
2020 ◽  
Vol 12 (4) ◽  
pp. 840
Author(s):  
Esther Molero ◽  
Juan Jesús Fernández ◽  
Oscar Rodríguez-Alabanda ◽  
Guillermo Guerrero-Vaca ◽  
Pablo E. Romero
Keyword(s):  
Data Mining ◽  
Surface Roughness ◽  
Polylactic Acid ◽  
Fused Deposition Modeling ◽  
Extrusion Temperature ◽  
Practical Application ◽  
Direction Parallel ◽  
Layer Height ◽  
Fused Deposition ◽  
Deposition Modeling

In the present work, ten data mining algorithms have been used to generate models capable of predicting the surface roughness of parts printed on polylactic acid (PLA) by using fused deposition modeling (FDM). The models have been trained using experimental data measured on 27 horizontal (XY) and 27 vertical (XZ) specimens, printed using different values for the parameters studied (layer height, extrusion temperature, print speed, print acceleration and flow). The models generated by multilayer perceptron (MLP) and logistic model trees (LMT) have obtained the best results in a cross-validation. Although it does not obtain such optimal results, the J48 algorithm (C4.5) allows the generation of models in the form of a decision tree. These trees permit to determine which print parameters have an influence on the surface roughness. For XY specimens, the surface roughness measured in the direction parallel to the extrusion path (Ra,0,XY ) depends on the flow, the print temperature and the layer height; in the direction perpendicular to the extrusion path, the surface roughness (Ra,90,XY) depends only on the flow. For XZ specimens, the surface roughness measured in the direction parallel to the extrusion path (Ra,0,XZ) depends only on the print speed; in the direction perpendicular to the extrusion path (Ra,90,XZ), it depends on the layer height and the extrusion temperature. According to the study carried out, the most suitable set up provides values of Ra,0,XY, Ra,90,XY, Ra,0,XZ and Ra,90,XZ equal to 0.46, 1.18, 0.45 and 11.54, respectively. A practical application of this work is the manufacture of PLA frame glasses using FDM.

Investigation of In-Field Properties of YBCO Film with Artificial Pinning Centers

2006 ◽  
Vol 946 ◽  
Author(s):  
Hiroyoshi Kobayashi ◽  
Satoru Ishida ◽  
Kazuhiro Takahashi ◽  
Masaya Konishi ◽  
Akira Ibi ◽  
...  
Keyword(s):  
Critical Current ◽  
Ybco Film ◽  
Laser Deposition ◽  
Practical Application ◽  
Nano Structure ◽  
Pinning Centers ◽  
Artificial Pinning Centers ◽  
Bamboo Structure ◽  
Pinning Center ◽  
Near Future

ABSTRACTWe have investigated the thickness dependence of critical current for YBa2Cu3O7-x (YBCO) film with artificial pinning centers on metallic substrate. Artificial pinning centers were introduced by the pulsed laser deposition (PLD) using YBCO target including YSZ particles. The film over 1 μm in thickness exhibited with high critical current (Ic) of 40.7A in applied magnetic field of 3T parallel to the c-axis at 77K. This value was 5 times as high as the normal YBCO film without artificial pinning centers. The large Ic enabled us to approach to a practical application in the near future. Furthermore, it was clarified that the columnar nano-structure formed in the film, we call “the bamboo structure”, was a dominant pinning center because each Jc-θ curve of all thick films formed a universal line by the normalization of Jc. In addition, it was also found that YSZ addition has an optimal concentration for pinning by the study of YSZ concentration in the film.

Photoconductive Bi12MO20-type films prepared by pulsed laser deposition

1999 ◽  
Vol 14 (11) ◽  
pp. 4409-4417 ◽  
Author(s):  
J. E. Alfonso ◽  
M. J. Martín ◽  
V. Volkov ◽  
C. Zaldo ◽  
M. Aguiló ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Bulk Crystals ◽  
Stabilized Zirconia ◽  
Direction Parallel ◽  
Crystalline Films ◽  
Optical Modes ◽  
Krf Excimer Laser ◽  
Sillenite Structure

Bi12TiO20 (BTO); Bi12GaxBi1−xO19.5 (BGaO); and Bi12(M1/3P2/3)O20, M = Cd, Zn, and Ni (BMPO) thin films were prepared by pulsed laser deposition using a KrF excimer laser on (100)Y-stabilized zirconia (YSZ), (100)Bi12GeO20 (BGO), and (110)Bi12SiO20 (BSO) crystalline substrates. All these films have a sillenite structure. On (100)YSZ the sillenite is oriented as {310} with the 〈130〉 direction parallel to the 〈021〉YSZ directions (〈130〉{310}BTO〈021〉{100}YSZ). On (100)BGO and (110)BSO the sillenite film reproduces the substrate orientation, and the films formed are able to channel He+ particles. The optimum deposition temperatures for BTO and BGaO are 600 and 550 °C, respectively. Higher temperatures must be avoided to minimize the nucleation of Bi-deficient phases due to the diffusion of Bi into the YSZ substrates. BMPO films are polycrystalline. The lattice parameters of these films were determined. The crystalline films support guided optical modes. The refractive indices obtained for the films are close to those measured in bulk crystals, being slightly larger for films deposited on isomorphous sillenite substrates. The crystalline films deposited on YSZ are photoconductors when excited in the green and blue spectral regions.

A Technology of Printing Forgery Prevention for Certificates Based on Fingerprint Information

2010 ◽  
Vol 174 ◽  
pp. 112-117
Author(s):  
Liu Jie Sun ◽  
Lei Hong Zhang ◽  
Zhen Liu ◽  
Song Lin Zhuang
Keyword(s):  
Digital Watermarking ◽  
Fingerprint Recognition ◽  
New Method ◽  
Digital Printing ◽  
Practical Application ◽  
Fingerprint Image ◽  
Image Information ◽  
Identification Process ◽  
Generating Method ◽  
Information Collecting

A new method of printing forgery prevention for certificates is proposed after researching on various algorithms of digital watermarking technology, fingerprint recognition technology, watermarking technology, encryption, and digital printing technology. The fingerprint image of the certificate owner is regarded as a watermarking and inserted in the certificate carrier. The encrypted fingerprint holographic watermarking techique is applied to increase the safty of the certificate information and realize the forgery prevention. The certificate presswork which has the encrypted fingerprint holographic watermarking information is printed by the printer. In the identification process, an ordinary scanner is employed to input certificate image information. We can use the obtained decryption keys to extract the watermark information by blind digital watermarking extracting method. The fingerprint collected on site is authorized by the extracting fingerprint information. By combining digital watermarking with fingerprint recognition technology, we realized safe authentication of user’s identity with imperceptibility of digital watermarking and the uniqueness of fingerprint recognition. This technology has some advantages. It is simple in information collecting and generating method, low in facturing cost and high in safe authentication. It has some practical application value.

scholarly journals Orientation Preferred Structures in BaTiO3 Thin Films on Ni Substrates

2008 ◽  
Vol 1 ◽  
pp. 59-63 ◽  
Author(s):  
Jiechao Jiang ◽  
Efstathios I. Meletis ◽  
Z. Yuan ◽  
Jian Liu ◽  
Jenny Weaver ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Pulsed Laser ◽  
Growth Direction ◽  
Film Plane ◽  
Laser Deposition ◽  
Direction Parallel ◽  
Metallic Substrates ◽  
Transmission Electron ◽  
Crystalline Ceramic

We report the fabrication of the orientation preferred structures in BaTiO3 thin films on Ni substrates using pulsed laser deposition. Transmission electron microscopy studies showed that the films consist of crystalline structures of tetragonal BaTiO3. More than 60% of BaTiO3 grains in the films exhibit nearly the same crystallographic orientation with their a-axis lying in the film plane and the [011] direction parallel to the growth direction. Such orientation preferred structures were grown on a Ni nanocrystalline buffer layer. This result demonstrated the possibility of approximating an oriented single crystalline ceramic oxide structures on metallic substrates.

Progress In The Practical Application Of Automated Image Analysis To Tem Negatives

1977 ◽  
Vol 35 ◽  
pp. 214-217
Author(s):  
F. A. Heckman ◽  
E. Redman ◽  
J.E. Connolly
Keyword(s):  
Image Analysis ◽  
Image Quality ◽  
Exposure Time ◽  
Image Contrast ◽  
Automated Image Analysis ◽  
Practical Application ◽  
Factors Affecting ◽  
High Image Quality ◽  
Qualitative Evidence ◽  
Comprehensive Study

In our initial publication on this subject1) we reported results demonstrating that contrast is the most important factor in producing the high image quality required for reliable image analysis. We also listed the factors which enhance contrast in order of the experimentally determined magnitude of their effect. The two most powerful factors affecting image contrast attainable with sheet film are beam intensity and KV. At that time we had only qualitative evidence for the ranking of enhancing factors. Later we carried out the densitometric measurements which led to the results outlined below.Meaningful evaluations of the cause-effect relationships among the considerable number of variables in preparing EM negatives depend on doing things in a systematic way, varying only one parameter at a time. Unless otherwise noted, we adhered to the following procedure evolved during our comprehensive study:Philips EM-300; 30μ objective aperature; magnification 7000- 12000X, exposure time 1 second, anti-contamination device operating.

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