Effects of the Repetition Number on Static and Dynamic Magnetic Properties of Metal/Native Oxide Multilayer Films

The [Fe-Co-Si (2 nm)/native oxide]N multilayer films weredeposited on glass substrate by DC magnetron sputtering. The effect of repetitionnumber N on static and dynamicmagnetic properties of the multilayer films was investigated. Good soft magnetic properties have been obtained inthe multilayer films with repetition number more than 30. Relatively highvalues of the complex permeability and ferromagnetic resonance frequency wereobtained and they can be adjusted by changing the repetition number of themultilayer films.

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Soft magnetic properties of CoNbZrN microcrystalline films produced by dc magnetron sputtering

Electronics and Communications in Japan (Part II Electronics) ◽

10.1002/ecjb.4420740909 ◽

1991 ◽

Vol 74 (9) ◽

pp. 84-91

Author(s):

Yutaka Shimada ◽

Choji Miyakawa

Keyword(s):

Magnetic Properties ◽

Magnetron Sputtering ◽

Soft Magnetic Properties ◽

Dc Magnetron Sputtering ◽

Soft Magnetic

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Soft Magnetic Properties and High-Frequency Characteristics in FeCoSi/Native-Oxide Multilayer Films

IEEE Transactions on Magnetics ◽

10.1109/tmag.2008.2001626 ◽

2008 ◽

Vol 44 (11) ◽

pp. 3111-3114 ◽

Cited By ~ 10

Author(s):

Huaping Zuo ◽

Shihui Ge ◽

Zhenkun Wang ◽

Yuhua Xiao ◽

Dongsheng Yao

Keyword(s):

Magnetic Properties ◽

High Frequency ◽

Multilayer Films ◽

Frequency Characteristics ◽

Native Oxide ◽

Soft Magnetic Properties ◽

Soft Magnetic

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Влияние напряжения смещения и скорости осаждения на структуру и коэрцитивность пленок NiFe

Физика твердого тела ◽

10.21883/ftt.2020.12.50221.163 ◽

2020 ◽

Vol 62 (12) ◽

pp. 2174

Author(s):

А.С. Джумалиев ◽

C.Л. Высоцкий ◽

В.К. Сахаров

Keyword(s):

Grain Size ◽

Magnetic Properties ◽

Film Thickness ◽

Deposition Rate ◽

Entire Range ◽

Soft Magnetic Properties ◽

Supercritical State ◽

Dc Magnetron Sputtering ◽

Soft Magnetic ◽

Critical Film Thickness

Influence of the bias voltage Ub and the deposition rate  on the structure, grain size D, and coercivity Hc of NiFe films with the thickness d from 30 to 980 nm, grown onto Si / SiO2 substrates by DC magnetron sputtering, was studied. In the case Ub = 0, the decrease of  from ≈ nm/min to ≈ 7 nm/min is accompanied by the increase of the critical film thickness dcr from dcr ≈ 220 nm to dcr ≈ 270 nm. In this case, Hc in the films with d < dcr is characterized by the dependence Hc ~ D6 and varies from ~ 1 to ~ 20 Oe. In the case of Ub = -100 V, the effect of the deposition rate on the coercivity is much more noticeable. At ν = 7 and 14 nm / min, the films demonstrate soft magnetic properties (Нс ≈ 0.15 - 1.4 Oe) and the absence of dcr for the entire range of studied thicknesses. The films obtained at ν = 21 and 27 nm / min turn into the “supercritical” state at d ≥ dcr ≈ 520 nm, and, in the region d < dcr, they are characterized by the dependence Hc ~ D3 and by the increase of coercivity from ~ 0.35 to ~ 10 Oe.

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