BaTiO3 Functional Ceramics Thin Film Prepared by Self-Assembled Monolayers

2010 ◽  
Vol 105-106 ◽  
pp. 266-269
Author(s):  
Guo Qiang Tan ◽  
Cheng Zhang ◽  
Hong Yan Miao ◽  
Hui Jun Ren ◽  
Ao Xia

BaTiO3 thin film was prepared by the self-assembled monolayers technique and liquid phase deposition. The effects of pH values and the deposition temperature on the formation of BaTiO3 film were studied. The results showed that the Si substrate was in the precursor solution with 0.025mol/L (AHFT/BN/BA=1:1:3) and pH= 1.5. At 45°C deposited for 8h and annealed at 600°C for 2h, the BaTiO3 film with higher crystalline was prepared on the functionalized Si substrate. XRD and SEM tests showed that the film deposited in the precursor solution with different pH values appeared BaTiO3 characteristic peaks on the surface of every crystal. As pH values increased to 1.5 from 0.5, the strength of the film diffraction peak increased. But the width of the peak became smaller and the crystalline increased. When pH value was 2, due to the self-polymerized deposition of [Ti(OH)6]2-, it was easy to form the larger particles on the substrate. When the deposition temperature was 45°C, the acicular BaTiO3 film formed with the regular order and homogeneous planeness on the substrate. When the deposition temperature was between 55°C and 60°C, the dewatering and polymerizing speed between [Ti(OH)6]2- ions was higher than that between [Ti(OH)6]2- and -OH. The adsorption of the film to the Si substrate was weakened. It was easy for the film to fall off.

2010 ◽  
Vol 105-106 ◽  
pp. 270-273
Author(s):  
Hui Jun Ren ◽  
Guo Qiang Tan ◽  
Hong Yan Miao ◽  
Ya Yu Song ◽  
Ao Xia

In this article, (NH4)2TiF6, SrNO3 and H3BO3 were used as raw materials to prepare the precursor solution with the ratio of AHFT/SN/BA=1:1:3. The thin films of SrTiO3 were fabricated on the functional silicon substrates (100) by self-assembled monolayers (SAMs) with the liquid phase deposition (LPD). This article also studied the effects of wet state and the deposition temperature of the precursor solution before and after the functionalization of silicon substrate on the thin film growth. The results indicated that after the immersion in OTS for 30min, the surface contact angle of the silicon substrate changed from 24.64° to 100.91°. The substrate appeared hydrophobic property and it was irradiated by UV light for 30min. Then the surface contact angle of the substrate decreased to 5.00°. The substrate appeared hydrophilicity. The concentration of the precursor solution was 0.025 mol/L, the deposition temperature was 40°C and the deposition time was 9h, which were all helpful to SrTiO3 crystallization. XRD and SEM were used to characterize the physical phase of thin film and surface morphology at 600 °C with annealing and heat retaining for 2h. The results indicated that the thin film prepared by the mono-crystal Si substrate was SrTiO3 thin film with better crystalline. On the crystal surfaces of (110), (100), (200) and (211), there appeared the obvious diffraction peaks. The SrTiO3 grains on the surface had the clear outline and were regular and long columnar crystals.


2010 ◽  
Vol 105-106 ◽  
pp. 255-258
Author(s):  
Yu Qin Zheng ◽  
Guo Qiang Tan ◽  
Hong Yan Miao ◽  
Zhong Liang He ◽  
Ao Xia ◽  
...  

HfO2 thin film was successfully prepared on the silicon substrate by the Liquid Phase Deposition (LPD) and functionalized organic self-assembled monolayers (SAMs) method. Measurement of contact angle showed that SAMs surface characteristics changed from hydrophobic to hydrophilic after UV irradiation. Photographs of Metallographic Microscope showed that octadecyl trichlorosilane-self- assembled monolayers (OTS-SAMs) had an active effect on the deposition of HfO2 thin film. XRD, SEM and AFM images indicated that the HfO2 thin film with cubic crystal structure was smooth, uniform and dense. Its grain size was between 40-100 nm and the height of thin film varies between 20 and 100 nm.


2010 ◽  
Vol 105-106 ◽  
pp. 297-300
Author(s):  
Bo Qin ◽  
Guo Qiang Tan ◽  
Hong Yan Miao ◽  
Jian Liu ◽  
Ao Xia ◽  
...  

This article used PTCS to dispose the self-assembled substrate, and prepared the precursor by the ratio of AHFT / SN / BA = 1:1:3 and then immersed the functionalized substrate into the precursor supersaturated solution. With the colloidal particles absorption induced by SAMs, SrTiO3 thin film was prepared by the self-assembled monolayers with liquid phase deposition method. The effects of the time of UV radiation and the time of PTCS immersion on the substrate contact angle were studied and the time of UV radiation had an effect on the substrate functionalization after PTCS immersion. The results showed that the first UV radiation for 25 min, PTCS immersion for 7 min and the second UV radiation for 30 min were beneficial to the crystallization of SrTiO3. XRD and AFM were used to characterize the thin film physical phase and surface morphology at 600oCwith annealing and heat retaining for 2 hours. The results also showed that under the same condition, the SrTiO3 crystals on the thin film surface had the clear outline and the spherical crystals were distributed regularly and evenly.


2012 ◽  
Vol 512-515 ◽  
pp. 1244-1248
Author(s):  
Jun Yin ◽  
Guo Qiang Tan ◽  
Li Hua Song ◽  
Ao Xia ◽  
Hui Jun Ren

Using iron nitrate, bismuth nitrate, citric acid and glacial acetic acid as the raw materials, the BiFeO3 thin films in crystalline state were prepared on FTO substrate with the self-assembled monolayers by liquid phase deposition after graded induction and annealing at 550°C for 30min. The physical phase composition, the surface morphology and dielectric properties of the thin films were characterized respectively by XRD, SEM, and Precision LCR Meter. This paper studied that the deposition temperature and the number of film layers had the effects on the thin films. The results show that the as-prepared thin films show the random orientation and good crystalline. When the deposition temperature is 70°C, the surface of the as-prepared thin film is smooth and uniform. The size of grain is 100nm. The thin film has a dense structure without the apparent pore phase. When the test frequency is between 1kHz and 1MHz, the loss of the thin films is decreased as the increase of the number of the film layers. When the number of the layers is 15, the dielectric constant of the thin films is 44 and the loss is 0.02 when the test frequency is 10kHz.


2014 ◽  
Vol 104 (5) ◽  
pp. 051607 ◽  
Author(s):  
Peng Xiao ◽  
Linfeng Lan ◽  
Ting Dong ◽  
Zhenguo Lin ◽  
Wen Shi ◽  
...  

IEEE Access ◽  
2020 ◽  
Vol 8 ◽  
pp. 101834-101839
Author(s):  
Wei Zhong ◽  
Ruohe Yao ◽  
Zhijian Chen ◽  
Linfeng Lan ◽  
Rongsheng Chen

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