A Study on the Properties by Buffer Layer of TiAlN Films Deposited by Arc Ion Plating Method

2021 ◽  
Vol 70 (9) ◽  
pp. 1321-1326
Author(s):  
Woon-Jo Jeong
1999 ◽  
Vol 65 (635) ◽  
pp. 1635-1641 ◽  
Author(s):  
Yasuhiro MIKI ◽  
Tadashi TANIGUCHI ◽  
Kazuya KUSAKA ◽  
Takao HANABUSA ◽  
Eiji MAITANI

2006 ◽  
Vol 510-511 ◽  
pp. 410-413
Author(s):  
Y.A. Shapovalov ◽  
Dong Bok Lee

The high temperature oxidation behavior of the TiAl(La)N coating, which was deposited on a steel substrate by the arc-ion plating method, was investigated at 700, 800 and 900oC in atmospheric air. The oxidation kinetics of the coating were mainly governed by the inward diffusion of oxygen and outward transport of nitrogen. The oxide scale was porous, nonadherent, and prone to cracking, indicating the oxidation resistance above 700oC is poor.


2005 ◽  
Vol 2005.1 (0) ◽  
pp. 161-162
Author(s):  
Hiroyuki Hukuda ◽  
Daisuke Yonekura ◽  
Ri-ichi Murakami

2004 ◽  
Vol 177-178 ◽  
pp. 627-630 ◽  
Author(s):  
M. Uchida ◽  
N. Nihira ◽  
A. Mitsuo ◽  
K. Toyoda ◽  
K. Kubota ◽  
...  

1997 ◽  
Vol 48 (1) ◽  
pp. 31-35
Author(s):  
Toshihiko TAKEDA ◽  
Yoshiaki MORO ◽  
Shigeru ITO ◽  
Hisami YUMOTO ◽  
Kazuo AKASHI

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