Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry

2011 ◽  
Vol 50 (8S1) ◽  
pp. 08JG02 ◽  
Author(s):  
Tomohisa Ino ◽  
Tatsuya Hayashi ◽  
Keiji Ueno ◽  
Hajime Shirai
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