Retraction: “Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth”

2016 ◽  
Vol 55 (8) ◽  
pp. 089202 ◽  
Author(s):  
Aya Morita ◽  
Ikuo Watanabe ◽  
Naoki Ohta ◽  
Hajime Shirai
Keyword(s):  
Film Growth ◽  
Chemical Activity ◽  
Zno Films ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Oxygen Atoms

Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth

2011 ◽  
Vol 50 (8) ◽  
pp. 08JD02 ◽  
Author(s):  
Aya Morita ◽  
Ikuo Watanabe ◽  
Naoki Ohta ◽  
Hajime Shirai
Keyword(s):  
Film Growth ◽  
Chemical Activity ◽  
Zno Films ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Oxygen Atoms

Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth

2011 ◽  
Vol 50 (8S1) ◽  
pp. 08JD02 ◽  
Author(s):  
Aya Morita ◽  
Ikuo Watanabe ◽  
Naoki Ohta ◽  
Hajime Shirai
Keyword(s):  
Film Growth ◽  
Chemical Activity ◽  
Zno Films ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Oxygen Atoms

Chemical activity of oxygen atoms in the magnetron sputter-deposited ZnO films

2011 ◽  
Vol 519 (20) ◽  
pp. 6903-6909 ◽  
Author(s):  
Aya Morita ◽  
Ikuo Watanabe ◽  
Hajime Shirai
Keyword(s):  
Chemical Activity ◽  
Zno Films ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Oxygen Atoms

Role of oxygen atoms in the growth of magnetron sputter-deposited ZnO films

2010 ◽  
Vol 108 (3) ◽  
pp. 033521 ◽  
Author(s):  
Jin Jie ◽  
Aya Morita ◽  
Hajime Shirai
Keyword(s):  
Zno Films ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Oxygen Atoms

Anodic oxide film growth on thin magnetron sputter-deposited titanium layer

2014 ◽  
Vol 98 ◽  
pp. 102-106 ◽  
Author(s):  
Z. Liu ◽  
H. Liu ◽  
T. Hashimoto ◽  
G.E. Thompson ◽  
P. Skeldon
Keyword(s):  
Oxide Film ◽  
Film Growth ◽  
Anodic Oxide ◽  
Anodic Oxide Film ◽  
Titanium Layer ◽  
Magnetron Sputter ◽  
Sputter Deposited

Radio frequency magnetron sputter deposited ZnO films doped with Al, Ga and Ti

2017 ◽  
pp. 1-6
Author(s):  
Kah-Yoong Chan ◽  
Cheng-Yang Low ◽  
Benedict Wen-Cheun Au ◽  
Zi-Neng Ng ◽  
Mian-En Yeoh ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Radio Frequency Magnetron ◽  
Zno Films ◽  
Magnetron Sputter ◽  
Sputter Deposited

Structure and morphology of magnetron sputter deposited ultrathin ZnO films on confined polymeric template

2017 ◽  
Vol 414 ◽  
pp. 114-123 ◽  
Author(s):  
Ajaib Singh ◽  
Susanne Schipmann ◽  
Aakash Mathur ◽  
Dipayan Pal ◽  
Amartya Sengupta ◽  
...  
Keyword(s):  
Zno Films ◽  
Structure And Morphology ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Polymeric Template

Simulation of thin film step coverage and microstructure

1989 ◽  
Vol 67 (4) ◽  
pp. 347-350 ◽  
Author(s):  
M. J. Brett ◽  
K. L. Westra ◽  
T. Smy
Keyword(s):  
Thin Film ◽  
Film Growth ◽  
Substrate Surface ◽  
Surface Profile ◽  
Mobility Model ◽  
Surface Mobility ◽  
Planar Magnetron ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Sputter Deposited

Ballistic deposition of hard discs has been used for computer simulation of thin film growth over a step on a substrate surface. Up to 16 000 particles were deposited per simulation using an angular distribution of particle trajectories representative of planar magnetron sputter deposition and incorporating a surface mobility model for deposited particles. The simulated films show a surface profile evolution during growth and an orientation of columnar film microstructure that are very close to the surface profile and microstructure observed in real films of aluminum sputter deposited over an oxide step on a silicon substrate.

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