buffer electrode
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2019 ◽  
Vol 58 (14) ◽  
pp. 4622-4626 ◽  
Author(s):  
Yuanyuan Ma ◽  
Zhaowei Guo ◽  
Xiaoli Dong ◽  
Yonggang Wang ◽  
Yongyao Xia

2019 ◽  
Vol 131 (14) ◽  
pp. 4670-4674 ◽  
Author(s):  
Yuanyuan Ma ◽  
Zhaowei Guo ◽  
Xiaoli Dong ◽  
Yonggang Wang ◽  
Yongyao Xia

2016 ◽  
Vol 16 (4) ◽  
pp. 435-439 ◽  
Author(s):  
Hong Je Choi ◽  
Jin Woo Jang ◽  
Myoung Pyo Chun ◽  
Yong Soo Cho

2009 ◽  
Vol 30 (7) ◽  
pp. 703-705 ◽  
Author(s):  
Heng Yuan Lee ◽  
Pang-Shiu Chen ◽  
Tai-Yuan Wu ◽  
Yu Sheng Chen ◽  
F. Chen ◽  
...  

1995 ◽  
Vol 401 ◽  
Author(s):  
Pedro Barrios ◽  
Cheng Chung Li ◽  
Hong Koo Kim ◽  
Jean Blachere

AbstractWe have investigated the epitaxial growth of Er-doped BaTiO3 films using rf magnetron sputtering. The Er-doped films (0.5 - 1 μm thick) were deposited on MgO (001) single-crystal substrates at various temperatures (500 - 800 °C). The films deposited at 700 °C or above arehighly (001)- oriented with an in-plane epitaxial relationship of BaTiO3[100] ║ MgO[100], as confirmed by X-ray diffraction. The Er doped films were found to be compressively stressed, as-deposited. The amount of stress monotonically decreases as a function of the deposition temperature. The Er-doped epitaxial films show a strong room-temperature photoluminescence at 1.54 μm, which corresponds to intra-transitions of Er3+ ions. Electrical characterizationswere carried out on Er-doped BaTiO3 films that were grown on MgO with a conducting In203 buffer electrode. The measurement shows that the Er-doped BaTiO3 films are ferroelectric with a remanent polarization of 1.5 μC/cm2 and a coercive field of 40 kV/cm.


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