Magnetoelectric and Multiferroic Properties of BaTiO3/NiFe2O4/BaTiO3 Heterostructured Thin Films Grown by Pulsed Laser Deposition Technique

Development of lead-free BaTiO3/NiFe2O4/BaTiO3 (BTO/NFO/BTO) trilayer structure thin films is significant for the realization of eco-friendly and implantable microelectromechanical systems (MEMS)-based devices. In the present work, we report BTO/NFO/BTO trilayer structure as a representative ferroelectric/ferromagnetic/ferroelectric (FE/FM/FE) system deposited on Pt(111)/TiO2/SiO2/Si using Pulsed Laser Deposition (PLD) technique. We report the ferroelectric, magnetic, and ME properties of BTO/NFO/BTO trilayer nanoscale heterostructure having dimensions 140/80/140 nm, at room temperature. High room temperature dielectric constant ~2145 at 100 Hz with low dielectric loss ~0.05 at 1 MHz is observed. Further, the deposited (BTO/NFO/BTO) tri-layered thin films showed magnetoelectric, multiferroic behavior with remanent polarization of 8.63 μCcm−2 at about 0.25 MV/cm and a reasonably high saturation magnetization of ~16 emu/cm3 at ~10 kOe is witnessed at room temperature. Tri-layered films have shown interesting magnetoelectric (ME) coupling coefficient (αE) ~54.5 mV/cm Oe at room temperature.

Delamination of Acuseal early cannulation arteriovenous graft months after implantation

Arteriovenous fistula is recommended, but arteriovenous graft is acceptable when a fistula is not possible. Acuseal is an early cannulation graft with a trilayer structure. Although primary patency rates of Acuseal appear to be similar to those of other standard grafts, few studies have investigated long-term results and complications. In our series, delamination of the wall structure occurred in 5.1% (6/115) by 21 months after Acuseal implantation. The causes could be divided into cannulation-related and cannulation-unrelated. Here, we describe the six cases in which delamination of the wall structure occurred in the medium term after Acuseal implantation.