mocvd precursors
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Heteroleptic Tin(IV) Aminoalkoxides and Aminofluoroalkoxides as MOCVD Precursors for Undoped and F-Doped SnO2 Thin Films

2020 ◽  
Vol 59 (10) ◽  
pp. 7167-7180 ◽  
Author(s):  
Alexandre Verchère ◽  
Shashank Mishra ◽  
Erwann Jeanneau ◽  
Hervé Guillon ◽  
Jean-Manuel Decams ◽  
...  
Keyword(s):  
Thin Films ◽  
Mocvd Precursors ◽  
Sno2 Thin Films

scholarly journals Ruthenium(II) MOCVD Precursors for Phosphorus‐Doped Ruthenium Layer Formation

2020 ◽  
Vol 2020 (17) ◽  
pp. 1612-1623
Author(s):  
Andrea Preuß ◽  
Jelena Tamuliene ◽  
Katarzyna Madajska ◽  
Iwona B. Szymanska ◽  
Marcus Korb ◽  
...  
Keyword(s):  
Layer Formation ◽  
Mocvd Precursors ◽  
Phosphorus Doped

Novel Highly Volatile MOCVD Precursors for Ta2O5 and Nb2O5 Thin Films

2019 ◽  
Vol 16 (5) ◽  
pp. 243-251 ◽  
Author(s):  
Tadahiro Yotsuya ◽  
Hirokazu Chiba ◽  
Taishi Furukawa ◽  
Toshiki Yamamoto ◽  
Koichiro Inaba ◽  
...  
Keyword(s):  
Thin Films ◽  
Mocvd Precursors

Preparation of Heteroleptic Tin(IV) N,O-β-Heteroarylalkenolate Complexes and Their Properties as PI-MOCVD Precursors for SnO2 Deposition

2018 ◽  
Vol 2018 (46) ◽  
pp. 5027-5035 ◽  
Author(s):  
Jan Podhorsky ◽  
Tomas Murauskas ◽  
Corinna Hegemann ◽  
David Graf ◽  
Thomas Fischer ◽  
...  
Keyword(s):  
Mocvd Precursors

Heterobimetallic Sodium Rare-Earth Complexes: “Third-Generation” MOCVD Precursors for the Deposition of NaREF4 (RE = Y, Gd) Films

2018 ◽  
Vol 57 (24) ◽  
pp. 15035-15039 ◽  
Author(s):  
Sergio Battiato ◽  
Patrizia Rossi ◽  
Paola Paoli ◽  
Graziella Malandrino
Keyword(s):  
Rare Earth ◽  
Rare Earth Complexes ◽  
Third Generation ◽  
Mocvd Precursors

Synthesis and characterization of heteroleptic titanium MOCVD precursors for TiO2 thin films

2018 ◽  
Vol 47 (7) ◽  
pp. 2415-2421 ◽  
Author(s):  
Euk Hyun Kim ◽  
Min Hyuk Lim ◽  
Myoung Soo Lah ◽  
Sang Man Koo
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Bidentate Ligands ◽  
Titanium Alkoxides ◽  
Tio2 Thin Films ◽  
Metal Organic ◽  
Mocvd Precursors ◽  
Organic Chemical Vapor Deposition

Heteroleptic titanium alkoxides with three different ligands, i.e., [Ti(OiPr)(X)(Y)] (X = tridentate, Y = bidentate ligands), were synthesized to find efficient metal organic chemical vapor deposition (MOCVD) precursors for TiO2 thin films.

Prediction of the relative probability and the kinetic parameters of bonds breakage in the molecules of palladium MOCVD precursors

2017 ◽  
Vol 1139 ◽  
pp. 269-274 ◽  
Author(s):  
Pavel O. Krasnov ◽  
Natalia S. Mikhaleva ◽  
Aleksander A. Kuzubov ◽  
Natalia S. Nikolaeva ◽  
Galina I. Zharkova ◽  
...  
Keyword(s):  
Kinetic Parameters ◽  
Relative Probability ◽  
Mocvd Precursors

Thermal properties of mixed-ligand magnesium complexes with beta-diketonates and diamimes as potential MOCVD precursors

2014 ◽  
Vol 118 (2) ◽  
pp. 849-856 ◽  
Author(s):  
Evgeniia S. Vikulova ◽  
Kseniya V. Zherikova ◽  
Ilia V. Korolkov ◽  
Ludmila N. Zelenina ◽  
Tamara P. Chusova ◽  
...  
Keyword(s):  
Thermal Properties ◽  
Mixed Ligand ◽  
Mocvd Precursors ◽  
Magnesium Complexes

scholarly journals New Heteroleptic Copper(II) Complexes as MOCVD Precursors

2013 ◽  
Vol 46 ◽  
pp. 174-182 ◽  
Author(s):  
V.V. Krisyuk ◽  
S.V. Sysoev ◽  
Y.M. Rumyantsev ◽  
S.A. Prokhorova ◽  
E.V. Maximovskiy ◽  
...  
Keyword(s):  
Mocvd Precursors
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