Synthesis and characterization of heteroleptic titanium MOCVD precursors for TiO2 thin films

2018 ◽  
Vol 47 (7) ◽  
pp. 2415-2421 ◽  
Author(s):  
Euk Hyun Kim ◽  
Min Hyuk Lim ◽  
Myoung Soo Lah ◽  
Sang Man Koo
Keyword(s):  
Thin Films ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Bidentate Ligands ◽  
Titanium Alkoxides ◽  
Tio2 Thin Films ◽  
Metal Organic ◽  
Mocvd Precursors ◽  
Organic Chemical Vapor Deposition

Heteroleptic titanium alkoxides with three different ligands, i.e., [Ti(OiPr)(X)(Y)] (X = tridentate, Y = bidentate ligands), were synthesized to find efficient metal organic chemical vapor deposition (MOCVD) precursors for TiO2 thin films.

Preparation and characterization of thin films of alumina by metal-organic chemical vapor deposition

1988 ◽  
Vol 23 (1) ◽  
pp. 31-36 ◽  
Author(s):  
J. Fournier ◽  
W. DeSisto ◽  
R. Brusasco ◽  
M. Sosnowski ◽  
R. Kershaw ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition
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