ultrathin oxide films
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2021 ◽  
pp. 2101006
Author(s):  
Judith Gabel ◽  
Matthias Pickem ◽  
Philipp Scheiderer ◽  
Lenart Dudy ◽  
Berengar Leikert ◽  
...  


2021 ◽  
Vol 104 (2) ◽  
Author(s):  
Matthias Pickem ◽  
Josef Kaufmann ◽  
Karsten Held ◽  
Jan M. Tomczak


Author(s):  
Falko P. Netzer ◽  
Claudine Noguera

This chapter outlines the fabrication methods of oxide thin films, from the oxidation of the outer layers of bulk elemental solids to thin film deposition methodologies. The classical theories treating the thermal oxidation of metals and silicon are reviewed. A particular focus is put on the oxidation of alloy single crystal surfaces to generate ultrathin oxide films and the formation of surface oxides, the latter as precursor layers for thicker bulk-type oxide phases. The diverse deposition techniques to grow epitaxial thin oxide films are introduced, with a classification into physical and chemical methods for the ease of presentation; the benefits and disadvantages of the different methods are pointed out. The synthesis of oxide nanoparticles is discussed in the gas phase and in liquid phase environments. The fundamental concepts of nucleation and growth of thin films and nanoparticles are introduced, including the classical capillary approach and atomistic descriptions.









2017 ◽  
Vol 32 (21) ◽  
pp. 3924-3935 ◽  
Author(s):  
Thomas Obermüller ◽  
Nassar Doudin ◽  
David Kuhness ◽  
Svetlozar Surnev ◽  
Falko P. Netzer

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