projection pressure
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2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Erfan Maleki ◽  
Sara Bagherifard ◽  
Okan Unal ◽  
Michele Bandini ◽  
Gholam Hossein Farrahi ◽  
...  

AbstractShot peening is widely used for improving mechanical properties especially fatigue behavior of metallic components by inducing surface hardening, compressive residual stresses and surface grain refinement. In air blast shot peening, projection pressure and surface coverage (an index of peening duration) have been considered as major controlling process parameters; the combination of these parameters plays a critical role in the beneficial effects of shot peening. Generally in severe shot peening aimed at obtaining surface grain refinement, constant values of pressure are considered with different peening durations. Considering very high peening duration, however, the phenomenon of over shot peening, which can be identified with the formation of surface defects could occur. The present study introduces a novel shot peening treatment, here called gradient severe shot peening (GSSP) that instead of using constant projection pressure, implements gradually increasing or decreasing pressures. The gradual increase of the projection pressure acts as a pre-hardening stage for the following higher projection pressure boosting the potential of the material to tolerate the sequential impacts and thus become less prone to the formation of surface defects. The results of the experiments indicate significant fatigue life improvement obtained for GSSP treated specimens compared to the standard treatment with constant pressure. GSSP avoids the detrimental effects of over-peening, while maintaining the beneficial effects of surface nano-crystallization, surface hardening and compressive residual stresses. The notable difference in fatigue strength enhancement for GSSP treated material can be also attributed to the modulated surface morphology with lower surface roughness compared to a standard shot peening treatment with the same exposure time.


2014 ◽  
Vol 6 (10) ◽  
pp. 2203-2209
Author(s):  
Min-Su Han ◽  
Jae-Yong Jeong ◽  
Kaong-Yong Hyun ◽  
Seong-Jong Kim

2012 ◽  
Vol 2012 ◽  
pp. 1-10
Author(s):  
Chenwei Wang ◽  
Ercai Chen

Let{Si}i=1lbe a weakly conformal iterated function system onRdwith attractorK. Letπbe the canonical projection. In this paper we define a new concept called “projection pressure”Pπ(φ)forφ∈C(Σ)and show the variational principle about the projection pressure under AWSC. Furthermore, we check that the zero of “projection pressure” still satisfies Bowen's equation. Using the root of Bowen's equation, we can get the Hausdorff dimension of the attractorK.


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