Studies of Thermal Anisotropy in 4H-, 6H-SiC Bulk Single Crystal Wafers by Photopyroelectric (PPE) Method

Thermal anisotropy in 4H-, and 6H-SiC bulk single crystal wafers was studied by the PPE method. The thermal diffusivities of the [1-100] and [11-20] orientations (^c-axis) samples were higher than those of the [0001] orientation (//c-axis) samples. Moreover, the thermal anisotropies of the lattice component and the carrier component were analyzed by Raman measurement.

Photopyroelectric (PPE) determination of thermal diffusivity of Bi2Te2.85Se0.15 sintered thermoelectric semiconductors

Thermal diffusivity of the sintered semiconductors was measured by the photopyroelectric (PPE) method. The measurement based on the phase-modulation frequency characteristics was shown to give superior results, eliminating errors expected in the conventional signal amplitude-distance characteristics measurements. Thermal diffusivities of the melt-grown and hot-pressed samples were found to be αmelt(c⊥) = 0.014 cm2/s, αmelt(c//) = 0.011 cm2/s, αhot(c⊥) = 0.012 cm2/s, and αhot(c//) = 0.008 cm2/s, depending on the relation between the c-axis direction of grain and thermal flow direction. The thermal diffusivity of the hot-pressed samples shows a strong dependence on the hot-press pressure through the orientation factor.