2012 IEEE International Conference on Microelectronic Test Structures
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TOTAL DOCUMENTS

61

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5

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Published By IEEE

9781467310307, 9781467310277, 9781467310291

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

A novel high-throughput on-wafer electromechanical sensitivity characterization system for piezoresistive cantilevers

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190613 ◽

2012 ◽

Author(s):

G. Tosolini ◽

L. G. Villanueva ◽

F. Perez-Murano ◽

J. Bausells

Keyword(s):

High Throughput ◽

Piezoresistive Cantilevers

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Session 1: Design margin

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190601 ◽

2012 ◽

Author(s):

Christopher Hess ◽

Emilio Lora-Tamayo

Keyword(s):

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Active “multi-fingers”: Test structure to improve MOSFET matching in sub-threshold area

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190652 ◽

2012 ◽

Author(s):

Y. Joly ◽

L. Lopez ◽

J.-M. Portal ◽

H. Aziza ◽

Y. Bert ◽

...

Keyword(s):

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Threshold voltage variation extracted from MOSFET C-V curves by charge-based capacitance measurement

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190623 ◽

2012 ◽

Author(s):

Katsuhiro Tsuji ◽

Kazuo Terada ◽

Ryo Takeda ◽

Takaaki Tsunomura ◽

Akio Nishida ◽

...

Keyword(s):

Threshold Voltage ◽

Capacitance Measurement ◽

Voltage Variation

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Session 3: MEMS

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190610 ◽

2012 ◽

Author(s):

Yoshio Mita ◽

Greg M. Yeric

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Session 6: RF

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190636 ◽

2012 ◽

Author(s):

Colin McAndrew ◽

Tatsuya Ohguro

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Combined C-V/I-V front-end-of-line measurement

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190656 ◽

2012 ◽

Author(s):

Stas Polonsky ◽

Simeon Realov ◽

Jiun-Hsin Liao ◽

Michael Hargrove ◽

Mark Ketchen

Keyword(s):

Front End ◽

Line Measurement

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A novel compact CBCM method for high resolution measurement in 28nm CMOS technology

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190619 ◽

2012 ◽

Author(s):

Kin Hooi Dia ◽

Willy Tsao ◽

Cheng Hsing Chien ◽

Zheng Zeng

Keyword(s):

High Resolution ◽

Cmos Technology ◽

High Resolution Measurement ◽

Resolution Measurement

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New evaluation method of low-k dielectric films by using a gated PN-junction diode and a field MOS transistor

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190632 ◽

2012 ◽

Author(s):

Yoichi Tamaki ◽

Masaki Ito ◽

Masaru Hashino ◽

Yoshifumi Kawamoto

Keyword(s):

Evaluation Method ◽

Dielectric Films ◽

Mos Transistor ◽

Pn Junction ◽

Junction Diode ◽

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Evaluation of dynamic bonding stress and interlayer cracking using a combo sensor

2012 IEEE International Conference on Microelectronic Test Structures ◽

10.1109/icmts.2012.6190647 ◽

2012 ◽

Author(s):

Yoshihiko Miki ◽

Hirobumi Watanabe

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