2014 20th International Conference on Ion Implantation Technology (IIT)
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120
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9781479952120
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Characterization of arsenic PIII implants in FinFETs by LEXES, SIMS and STEM-EDX

2014 ◽  
Author(s):  
Kim-Anh Bui-Thi Meura ◽  
Frank Torregrosa ◽  
Anne-Sophie Robbes ◽  
Seoyoun Choi ◽  
Alexandre Merkulov ◽  
...  

The influence of dose rate on ultra shallow surface dopant profile

2014 ◽  
Author(s):  
Shao-Yu Hu ◽  
Ger-Pin Lin ◽  
Ching-I Li ◽  
Hong Lu ◽  
Zhimin Wan
Keyword(s):  
Dose Rate ◽  
Dopant Profile

High energy hydrogen and helium ion implanter

2014 ◽  
Author(s):  
Shengwu Chang ◽  
Brian Gori ◽  
Curt Norris ◽  
Jeff Klein ◽  
Kurt Decker-Lucke
Keyword(s):  
High Energy ◽  
Helium Ion

Integrated divergent beam for FinFET Conformal Doping

2014 ◽  
Author(s):  
Ching-I Li ◽  
Ger-Pin Lin ◽  
Rekha Padmanabhan ◽  
Gary N. Cai ◽  
Zhimin Wan ◽  
...  
Keyword(s):  
Divergent Beam

Using SuperScan™ and SuperScan II™ to improve Vt variations in a p-channel power MOSFET device

2014 ◽  
Author(s):  
Scott Falk ◽  
Youn-Ki Kim ◽  
Reiner Kaspareit ◽  
Benjamin Colombeau ◽  
Yves Ritterhaus ◽  
...  
Keyword(s):  
Channel Power ◽  
Power Mosfet

SEN's SAVING techniques for productivity enhancement

2014 ◽  
Author(s):  
Shiro Ninomiya ◽  
Yasuharu Okamoto ◽  
Akihiro Ochi ◽  
Toshio Yumiyama ◽  
Yasuhiko Kimura ◽  
...  
Keyword(s):  
Productivity Enhancement
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