Particles in Gases and Liquids 1
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19

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Published By Springer US

9781461280859, 9781461307938

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Improved Methodology for Measurement of Particle Concentrations in Semiconductor Process Chemicals

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_6 ◽

1989 ◽

pp. 121-134 ◽

Author(s):

Donald C. Grant

Keyword(s):

Semiconductor Process

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Particulate Generation in Devices Used in Clean Manufacturing

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_19 ◽

1989 ◽

pp. 283-293 ◽

Author(s):

H. S. Nagaraj ◽

B. L. Owens ◽

R. J. Miller

Keyword(s):

Clean Manufacturing

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Influence of Particle Charge on the Collection Efficiency of Electrified Filter Mats

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_14 ◽

1989 ◽

pp. 205-221

Author(s):

M. K. Mazumder ◽

A. M. Siag

Keyword(s):

Collection Efficiency ◽

Particle Charge

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Design and Practical Considerations in Using Cascade Impactors to Collect Particle Samples from Process Gases for Identification

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_9 ◽

1989 ◽

pp. 157-165 ◽

Author(s):

W. L. Chiang ◽

R. L. Chuan

Keyword(s):

Process Gases ◽

Cascade Impactors

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Particle Counting of Liquid Systems Using a Scanning Electron Microscope

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_5 ◽

1989 ◽

pp. 97-119 ◽

Author(s):

W. A. Zorn

Keyword(s):

Electron Microscope ◽

Scanning Electron Microscope ◽

Particle Counting ◽

Liquid Systems ◽

Scanning Electron

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Non-Poisson Models of Particle Counting

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_3 ◽

1989 ◽

pp. 51-79 ◽

Author(s):

R. A. Van Slooten ◽

M. L. Malczewski

Keyword(s):

Poisson Models ◽

Particle Counting

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Particle Contributions of Three Types of Cleanroom Jumpsuits

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_18 ◽

1989 ◽

pp. 273-281 ◽

Author(s):

R. C. White ◽

J. R. Weaver

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A Fluid Dynamic Study of a Microcontaminant Particles Removal Process

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_16 ◽

1989 ◽

pp. 235-257 ◽

Author(s):

Ahmed A. Busnaina ◽

M. A. R. Sharif ◽

Glenn Gale ◽

Frederick W. Kern

Keyword(s):

Fluid Dynamic ◽

Dynamic Study ◽

Removal Process

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A Real-Time Fallout Monitor for 5–250 Micrometer Particles

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_11 ◽

1989 ◽

pp. 175-184 ◽

Author(s):

Peter G. Borden ◽

Jon Munson ◽

Donald W. Bartelson

Keyword(s):

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In-Situ Monitoring of Particulate Contamination in Integrated Circuit Process Equipment

Particles in Gases and Liquids 1 ◽

10.1007/978-1-4613-0793-8_10 ◽

1989 ◽

pp. 167-173 ◽

Author(s):

Steven D. Cheung

Keyword(s):

Integrated Circuit ◽

In Situ Monitoring ◽

Process Equipment ◽

Particulate Contamination

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