scholarly journals Residual Stress Measurement in YBCO Thin Films

Author(s):  
Jae Hong Cheon ◽  
J. P. Singh
2012 ◽  
Vol 520 (6) ◽  
pp. 2073-2076 ◽  
Author(s):  
Xu Song ◽  
Kong Boon Yeap ◽  
Jing Zhu ◽  
Jonathan Belnoue ◽  
Marco Sebastiani ◽  
...  

2005 ◽  
Vol 490-491 ◽  
pp. 661-666
Author(s):  
Mitsuhiko Hataya ◽  
Hanabusa Takao ◽  
Kazuya Kusaka ◽  
Kikuo Tominaga ◽  
Tatsuya Matsue ◽  
...  

Author(s):  
Mitsuhiko Hataya ◽  
Takao Hanabusa ◽  
Kazuya Kusaka ◽  
Kikuo Tominaga ◽  
Tatsuya Matsue ◽  
...  

2008 ◽  
Vol 143 (2) ◽  
pp. 409-414 ◽  
Author(s):  
Da-Yong Qiao ◽  
Wei-Zheng Yuan ◽  
Yi-Ting Yu ◽  
Qing Liang ◽  
Zhi-Bo Ma ◽  
...  

1995 ◽  
Vol 403 ◽  
Author(s):  
L. G. Yu ◽  
B. C. Hendrix ◽  
K. W. Xu ◽  
J. W. He ◽  
H. C. Gu

AbstractX-ray diffraction provides an easy and powerful method for measuring residual stress in thin films. However, nonlinearity of the d vs. sin2ψ relation can lead to the misinterpretation of results, especially when one of the measurements is made at low values of ψ relation for different combinations of ideal crystallographic textures and grain shapes are given. In all cases, a high ψ angle range exists where the d vs. sin2ψ relation in the low ψ angle range.


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