Cross‐stream migration of nonspherical particles in second‐order fluid flows: Effect of flow profiles

AIChE Journal ◽  
2020 ◽  
Vol 66 (12) ◽  
Author(s):  
Cheng‐Wei Tai ◽  
Shiyan Wang ◽  
Vivek Narsimhan
1979 ◽  
Vol 92 (1) ◽  
pp. 131-170 ◽  
Author(s):  
P. C.-H. Chan ◽  
L. G. Leal

The cross-stream migration of a deformable drop in a unidirectional shear flow of a second-order fluid is considered. Expressions for the particle velocity due to the separate effects of deformation and viscoelastic rheology are obtained. The direction and magnitude of migration are calculated for the particular cases of Poiseuille flow and simple shear flow and compared with experimental data.


2019 ◽  
Vol 7 (1) ◽  
pp. 3-18
Author(s):  
Jonathan Colom-Cobb ◽  
Julio Garcia-Espinosa ◽  
Borja Servan-Camas ◽  
P. Nadukandi

1995 ◽  
Vol 26 (1) ◽  
pp. 13-19
Author(s):  
K. F. KUIKEN ◽  
J. T. MASTERSON

In this paper, parameterizations are constructed for spaces of automor­ phic second order differential equations on certam subsets of $\hat C$. These equations have coefficients with a countable number of regular singular points on fundamen­ tal domains for bimeromorphic deformations of Kleiman groups. The equations considered are generalizations of classically-considered equations, including the hy­ pergeometric and Heun's equations, or have singular points on fam1hes of curves, including lines, conic sections, Joukowski airfoils or biconformal images of these curves. Global fluid flows associate with these equations are constructed and classified.


2010 ◽  
Vol 81 (6) ◽  
Author(s):  
Hongwu Zhang ◽  
Zhongqiang Zhang ◽  
Yonggang Zheng ◽  
Hongfei Ye

Author(s):  
W. L. Bell

Disappearance voltages for second order reflections can be determined experimentally in a variety of ways. The more subjective methods, such as Kikuchi line disappearance and bend contour imaging, involve comparing a series of diffraction patterns or micrographs taken at intervals throughout the disappearance range and selecting that voltage which gives the strongest disappearance effect. The estimated accuracies of these methods are both to within 10 kV, or about 2-4%, of the true disappearance voltage, which is quite sufficient for using these voltages in further calculations. However, it is the necessity of determining this information by comparisons of exposed plates rather than while operating the microscope that detracts from the immediate usefulness of these methods if there is reason to perform experiments at an unknown disappearance voltage.The convergent beam technique for determining the disappearance voltage has been found to be a highly objective method when it is applicable, i.e. when reasonable crystal perfection exists and an area of uniform thickness can be found. The criterion for determining this voltage is that the central maximum disappear from the rocking curve for the second order spot.


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