ChemInform Abstract: Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5-Hexamethylcyclotrisilazane (I) Plasmas.

T. A. BROOKS; D. W. HESS

doi:10.1002/chin.198913323

ChemInform Abstract: Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5-Hexamethylcyclotrisilazane (I) Plasmas.

ChemInform ◽

10.1002/chin.198913323 ◽

1989 ◽

Vol 20 (13) ◽

Author(s):

T. A. BROOKS ◽

D. W. HESS

Keyword(s):

Silicon Nitride ◽

Silicon Carbonitride ◽

Abstract Characterization

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ChemInform Abstract: Characterization of β-Silicon Nitride Whiskers

ChemInform ◽

10.1002/chin.199015005 ◽

1990 ◽

Vol 21 (15) ◽

Author(s):

J. HOMENY ◽

L. J. NEERGAARD ◽

K. R. KARASEK ◽

J. T. DONNER ◽

S. A. BRADLEY

Keyword(s):

Silicon Nitride ◽

Abstract Characterization

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Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5‐Hexamethylcyclotrisilazane Plasmas

Journal of The Electrochemical Society ◽

10.1149/1.2095507 ◽

1988 ◽

Vol 135 (12) ◽

pp. 3086-3093 ◽

Cited By ~ 5

Author(s):

T. A. Brooks ◽

D. W. Hess

Keyword(s):

Silicon Nitride ◽

Silicon Carbonitride

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ChemInform Abstract: Characterization of Silicon Nitride Films Deposited on GaAs by RF Magnetron Cathodic Sputtering. Effects of Power Density and Total Gas Pressure

ChemInform ◽

10.1002/chin.199031329 ◽

1990 ◽

Vol 21 (31) ◽

Author(s):

T. CARRIERE ◽

B. AGIUS ◽

I. VICKRIDGE ◽

J. SIEJKA ◽

P. ALNOT

Keyword(s):

Silicon Nitride ◽

Power Density ◽

Gas Pressure ◽

Abstract Characterization ◽

Silicon Nitride Films ◽

Cathodic Sputtering

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MATERIAL PROPERTIES ANALYSIS OF CIRCUIT SUBASSEMBLIES: QUANTITATIVE CHARACTERIZATION OF SAPPHIRE (alpha-Al203) AND SILICON NITRIDE (Si3N4) USING CRYOGENIC CYCLING

10.1615/tfec2019.ref.027456 ◽

2019 ◽

Author(s):

Kirsten A. Lovelace ◽

Sonya T. Smith

Keyword(s):

Silicon Nitride ◽

Material Properties ◽

Quantitative Characterization

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Abstract Characterization of Input Symbol Semigroups of Universal Hypergraphic Automata

Lobachevskii Journal of Mathematics ◽

10.1134/s1995080220020109 ◽

2020 ◽

Vol 41 (2) ◽

pp. 214-226

Author(s):

E. V. Khvorostukhina ◽

V. A. Molchanov

Keyword(s):

Input Symbol ◽

Abstract Characterization

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ChemInform Abstract: Characterization of Nitrobenzanthracenes and Nitrodibenzanthracenes.

Chemischer Informationsdienst ◽

10.1002/chin.198616186 ◽

1986 ◽

Vol 17 (16) ◽

Author(s):

B. IVERSEN ◽

L. K. SYDNES ◽

T. GREIBROKK

Keyword(s):

Abstract Characterization

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ChemInform Abstract: CHARACTERIZATION OF CATALYST SURFACES BY CYCLIC VOLTAMMETRY

Chemischer Informationsdienst ◽

10.1002/chin.197839337 ◽

1978 ◽

Vol 9 (39) ◽

Author(s):

D. R. LOWDE ◽

J. O. WILLIAMS ◽

B. D. MCNICOL

Keyword(s):

Cyclic Voltammetry ◽

Abstract Characterization ◽

Catalyst Surfaces

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ChemInform Abstract: Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199406262 ◽

2010 ◽

Vol 25 (6) ◽

pp. no-no

Author(s):

X.-L. XU ◽

P. K. MCLARTY ◽

H. BRUSH ◽

V. MISRA ◽

J. J. WORTMAN ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Oxynitride ◽

Thermal Chemical Vapor Deposition ◽

Abstract Characterization ◽

Thin Silicon

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Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4705512 ◽

2012 ◽

Vol 30 (3) ◽

pp. 031303 ◽

Cited By ~ 5

Author(s):

Bayu A. Thedjoisworo ◽

David Cheung ◽

Davoud Zamani

Keyword(s):

Silicon Nitride ◽

Hydrogen Plasma ◽

Plasma Interactions

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ChemInform Abstract: Characterization of Catalytic Solids by Kinetics

ChemInform ◽

10.1002/chin.199508283 ◽

2010 ◽

Vol 26 (8) ◽

pp. no-no

Author(s):

A. GERMAIN

Keyword(s):

Abstract Characterization

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