ChemInform Abstract: Characterization of Silicon Nitride Films Deposited on GaAs by RF Magnetron Cathodic Sputtering. Effects of Power Density and Total Gas Pressure

ChemInform ◽  
1990 ◽  
Vol 21 (31) ◽  
Author(s):  
T. CARRIERE ◽  
B. AGIUS ◽  
I. VICKRIDGE ◽  
J. SIEJKA ◽  
P. ALNOT
Keyword(s):  
Silicon Nitride ◽  
Power Density ◽  
Gas Pressure ◽  
Abstract Characterization ◽  
Silicon Nitride Films ◽  
Cathodic Sputtering

Characterization of Chemically Vapor Deposited Silicon Nitride Films from Disilane and Ammonia

1995 ◽  
Vol 34 (Part 2, No. 4A) ◽  
pp. L437-L439 ◽  
Author(s):  
Redhouane Henda ◽  
Larbi Laanab ◽  
EmmanuelScheid ◽  
Robert Fourmeaux
Keyword(s):  
Silicon Nitride ◽  
Silicon Nitride Films ◽  
Chemically Vapor Deposited

Surface Characterization of Silicon Nitride Films Biased in Ionic Water

2000 ◽  
Vol 147 (4) ◽  
pp. 1493
Author(s):  
K. Matsuzaki ◽  
Y. Mikoshiba ◽  
H. Fujiwara
Keyword(s):  
Silicon Nitride ◽  
Surface Characterization ◽  
Silicon Nitride Films

Characterization of silicon nitride films formed in an RF glow discharge

1988 ◽  
Vol 33-34 ◽  
pp. 742-749 ◽  
Author(s):  
Kenji Murakami ◽  
Takayuki Takeuchi ◽  
Kenji Ishikawa ◽  
Tatsuo Yamamoto
Keyword(s):  
Silicon Nitride ◽  
Glow Discharge ◽  
Silicon Nitride Films ◽  
Rf Glow Discharge
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