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ChemInform Abstract: Characterization of β-Silicon Nitride Whiskers
ChemInform
◽
10.1002/chin.199015005
◽
1990
◽
Vol 21
(15)
◽
Author(s):
J. HOMENY
◽
L. J. NEERGAARD
◽
K. R. KARASEK
◽
J. T. DONNER
◽
S. A. BRADLEY
Keyword(s):
Silicon Nitride
◽
Abstract Characterization
Download Full-text
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Cited By
References
ChemInform Abstract: Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5-Hexamethylcyclotrisilazane (I) Plasmas.
ChemInform
◽
10.1002/chin.198913323
◽
1989
◽
Vol 20
(13)
◽
Author(s):
T. A. BROOKS
◽
D. W. HESS
Keyword(s):
Silicon Nitride
◽
Silicon Carbonitride
◽
Abstract Characterization
Download Full-text
ChemInform Abstract: Characterization of Silicon Nitride Films Deposited on GaAs by RF Magnetron Cathodic Sputtering. Effects of Power Density and Total Gas Pressure
ChemInform
◽
10.1002/chin.199031329
◽
1990
◽
Vol 21
(31)
◽
Author(s):
T. CARRIERE
◽
B. AGIUS
◽
I. VICKRIDGE
◽
J. SIEJKA
◽
P. ALNOT
Keyword(s):
Silicon Nitride
◽
Power Density
◽
Gas Pressure
◽
Abstract Characterization
◽
Silicon Nitride Films
◽
Cathodic Sputtering
Download Full-text
MATERIAL PROPERTIES ANALYSIS OF CIRCUIT SUBASSEMBLIES: QUANTITATIVE CHARACTERIZATION OF SAPPHIRE (alpha-Al203) AND SILICON NITRIDE (Si3N4) USING CRYOGENIC CYCLING
10.1615/tfec2019.ref.027456
◽
2019
◽
Author(s):
Kirsten A. Lovelace
◽
Sonya T. Smith
Keyword(s):
Silicon Nitride
◽
Material Properties
◽
Quantitative Characterization
Download Full-text
Abstract Characterization of Input Symbol Semigroups of Universal Hypergraphic Automata
Lobachevskii Journal of Mathematics
◽
10.1134/s1995080220020109
◽
2020
◽
Vol 41
(2)
◽
pp. 214-226
Author(s):
E. V. Khvorostukhina
◽
V. A. Molchanov
Keyword(s):
Input Symbol
◽
Abstract Characterization
Download Full-text
ChemInform Abstract: Characterization of Nitrobenzanthracenes and Nitrodibenzanthracenes.
Chemischer Informationsdienst
◽
10.1002/chin.198616186
◽
1986
◽
Vol 17
(16)
◽
Author(s):
B. IVERSEN
◽
L. K. SYDNES
◽
T. GREIBROKK
Keyword(s):
Abstract Characterization
Download Full-text
ChemInform Abstract: CHARACTERIZATION OF CATALYST SURFACES BY CYCLIC VOLTAMMETRY
Chemischer Informationsdienst
◽
10.1002/chin.197839337
◽
1978
◽
Vol 9
(39)
◽
Author(s):
D. R. LOWDE
◽
J. O. WILLIAMS
◽
B. D. MCNICOL
Keyword(s):
Cyclic Voltammetry
◽
Abstract Characterization
◽
Catalyst Surfaces
Download Full-text
ChemInform Abstract: Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition.
ChemInform
◽
10.1002/chin.199406262
◽
2010
◽
Vol 25
(6)
◽
pp. no-no
Author(s):
X.-L. XU
◽
P. K. MCLARTY
◽
H. BRUSH
◽
V. MISRA
◽
J. J. WORTMAN
◽
...
Keyword(s):
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Low Pressure
◽
Silicon Oxynitride
◽
Thermal Chemical Vapor Deposition
◽
Abstract Characterization
◽
Thin Silicon
Download Full-text
Characterization of hydrogen–plasma interactions with photoresist, silicon, and silicon nitride surfaces
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
◽
10.1116/1.4705512
◽
2012
◽
Vol 30
(3)
◽
pp. 031303
◽
Cited By ~ 5
Author(s):
Bayu A. Thedjoisworo
◽
David Cheung
◽
Davoud Zamani
Keyword(s):
Silicon Nitride
◽
Hydrogen Plasma
◽
Plasma Interactions
Download Full-text
ChemInform Abstract: Characterization of Catalytic Solids by Kinetics
ChemInform
◽
10.1002/chin.199508283
◽
2010
◽
Vol 26
(8)
◽
pp. no-no
Author(s):
A. GERMAIN
Keyword(s):
Abstract Characterization
Download Full-text
Fabrication and surface characterization of pulsed reactive closed-field unbalanced magnetron sputtered amorphous silicon nitride films
Surface and Coatings Technology
◽
10.1016/j.surfcoat.2004.12.007
◽
2006
◽
Vol 200
(12-13)
◽
pp. 4144-4151
◽
Cited By ~ 15
Author(s):
Zh.Q. Yao
◽
P. Yang
◽
N. Huang
◽
H. Sun
◽
G.J. Wan
◽
...
Keyword(s):
Silicon Nitride
◽
Amorphous Silicon
◽
Surface Characterization
◽
Closed Field
◽
Amorphous Silicon Nitride
◽
Silicon Nitride Films
◽
Unbalanced Magnetron
Download Full-text
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