scholarly journals Development of Rutile Titanium Oxide Thin Films as Battery Material Component Using Atomic Layer Deposition

2019 ◽  
Vol 217 (13) ◽  
pp. 1800769 ◽  
Author(s):  
Alireza M. Kia ◽  
Sascha Bönhardt ◽  
Sabine Zybell ◽  
Kati Kühnel ◽  
Nora Haufe ◽  
...  
2015 ◽  
Vol 33 (1) ◽  
pp. 01A127 ◽  
Author(s):  
Aile Tamm ◽  
Jekaterina Kozlova ◽  
Lauri Aarik ◽  
Jaan Aarik ◽  
Kaupo Kukli ◽  
...  

2014 ◽  
Vol 565 ◽  
pp. 261-266 ◽  
Author(s):  
Kaupo Kukli ◽  
Marianna Kemell ◽  
Mukesh Chandra Dimri ◽  
Esa Puukilainen ◽  
Aile Tamm ◽  
...  

2011 ◽  
Vol 519 (10) ◽  
pp. 3318-3324 ◽  
Author(s):  
Viljami Pore ◽  
Mukesh Dimri ◽  
Himani Khanduri ◽  
Raivo Stern ◽  
Jun Lu ◽  
...  

2015 ◽  
Vol 591 ◽  
pp. 55-59 ◽  
Author(s):  
H. Castán ◽  
H. García ◽  
S. Dueñas ◽  
L. Bailón ◽  
E. Miranda ◽  
...  

2012 ◽  
Vol 210 (2) ◽  
pp. 276-284 ◽  
Author(s):  
Jaesang Lee ◽  
Seung Jae Lee ◽  
Won Bae Han ◽  
Heeyoung Jeon ◽  
Jingyu Park ◽  
...  

2003 ◽  
Vol 59 (1) ◽  
pp. 1483-1489 ◽  
Author(s):  
Young Jin Cho ◽  
Yo-Sep Min ◽  
Jung-Hyun Lee ◽  
Bum-Seok Seo ◽  
June Key Lee ◽  
...  

CrystEngComm ◽  
2021 ◽  
Author(s):  
Pengmei Yu ◽  
Sebastian M. J. Beer ◽  
Anjana Devi ◽  
Mariona Coll

The growth of complex oxide thin films with atomic precision offers bright prospects to study improved properties and novel functionalities.


Author(s):  
Benjamin Rich ◽  
Yael Etinger-Geller ◽  
G. Ciatto ◽  
A Katsman ◽  
Boaz Pokroy

Size effects and structural modifications in amorphous TiO2 films deposited by atomic layer deposition (ALD) were investigated. As with the previously investigated ALD-deposited Al2O3 system we found that the film’s...


2014 ◽  
Vol 20 (7-8-9) ◽  
pp. 217-223 ◽  
Author(s):  
Timothee Blanquart ◽  
Mikko Kaipio ◽  
Jaakko Niinistö ◽  
Marco Gavagnin ◽  
Valentino Longo ◽  
...  

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