Deposition temperature dependence of titanium oxide thin films grown by remote-plasma atomic layer deposition

2012 ◽  
Vol 210 (2) ◽  
pp. 276-284 ◽  
Author(s):  
Jaesang Lee ◽  
Seung Jae Lee ◽  
Won Bae Han ◽  
Heeyoung Jeon ◽  
Jingyu Park ◽  
...  
2019 ◽  
Vol 40 (1) ◽  
pp. 012806 ◽  
Author(s):  
Hui Hao ◽  
Xiao Chen ◽  
Zhengcheng Li ◽  
Yang Shen ◽  
Hu Wang ◽  
...  

2015 ◽  
Vol 33 (1) ◽  
pp. 01A127 ◽  
Author(s):  
Aile Tamm ◽  
Jekaterina Kozlova ◽  
Lauri Aarik ◽  
Jaan Aarik ◽  
Kaupo Kukli ◽  
...  

2014 ◽  
Vol 565 ◽  
pp. 261-266 ◽  
Author(s):  
Kaupo Kukli ◽  
Marianna Kemell ◽  
Mukesh Chandra Dimri ◽  
Esa Puukilainen ◽  
Aile Tamm ◽  
...  

2016 ◽  
Vol 45 (46) ◽  
pp. 18737-18741 ◽  
Author(s):  
Hua Jin ◽  
Dirk Hagen ◽  
Maarit Karppinen

We present a new low-temperature atomic layer deposition (ALD) process based on Mn2(CO)10and ozone as precursors to fabricate crystalline α-Mn2O3and Mn3O4thin films; the phase composition is controlled by the deposition temperature such that the former phase forms in the range 60–100 °C and the latter in the range 120–160 °C.


2011 ◽  
Vol 519 (10) ◽  
pp. 3318-3324 ◽  
Author(s):  
Viljami Pore ◽  
Mukesh Dimri ◽  
Himani Khanduri ◽  
Raivo Stern ◽  
Jun Lu ◽  
...  

2015 ◽  
Vol 591 ◽  
pp. 55-59 ◽  
Author(s):  
H. Castán ◽  
H. García ◽  
S. Dueñas ◽  
L. Bailón ◽  
E. Miranda ◽  
...  

2019 ◽  
Vol 217 (13) ◽  
pp. 1800769 ◽  
Author(s):  
Alireza M. Kia ◽  
Sascha Bönhardt ◽  
Sabine Zybell ◽  
Kati Kühnel ◽  
Nora Haufe ◽  
...  

2003 ◽  
Vol 59 (1) ◽  
pp. 1483-1489 ◽  
Author(s):  
Young Jin Cho ◽  
Yo-Sep Min ◽  
Jung-Hyun Lee ◽  
Bum-Seok Seo ◽  
June Key Lee ◽  
...  

CrystEngComm ◽  
2021 ◽  
Author(s):  
Pengmei Yu ◽  
Sebastian M. J. Beer ◽  
Anjana Devi ◽  
Mariona Coll

The growth of complex oxide thin films with atomic precision offers bright prospects to study improved properties and novel functionalities.


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