Thin-film-growth characteristics by computer simulation: Nanostructural changes as a function of deposition conditions

2007 ◽  
Vol 244 (9) ◽  
pp. 3115-3136 ◽  
Author(s):  
Mehran Gholipour Shahraki ◽  
Hadi Savaloni
Keyword(s):  
Thin Film ◽  
Computer Simulation ◽  
Film Growth ◽  
Growth Characteristics ◽  
Thin Film Growth ◽  
Deposition Conditions

Computer simulation of thin film growth with thermal hopping of atoms

1992 ◽  
Author(s):  
J. Schutkeker ◽  
L. Chen ◽  
F. Wong ◽  
S. Patel ◽  
D. T. Shaw
Keyword(s):  
Thin Film ◽  
Computer Simulation ◽  
Film Growth ◽  
Thin Film Growth

Study of thin film growth by means of computer simulation and image analysis

Vacuum ◽  
2002 ◽  
Vol 67 (2) ◽  
pp. 229-233 ◽  
Author(s):  
R Hrach ◽  
J Šimek ◽  
M Kostern
Keyword(s):  
Thin Film ◽  
Computer Simulation ◽  
Image Analysis ◽  
Film Growth ◽  
Thin Film Growth

Computer Simulation of Early Stage in Thin-Film Growth

1999 ◽  
Vol 16 (4) ◽  
pp. 279-281 ◽  
Author(s):  
Feng-min Wu ◽  
Qiao-wen Li ◽  
Qi-peng Zhu ◽  
Zi-qin Wu
Keyword(s):  
Thin Film ◽  
Computer Simulation ◽  
Film Growth ◽  
Early Stage ◽  
Thin Film Growth

Computer simulation of thin film growth with defect formation

2003 ◽  
Vol 169-170 ◽  
pp. 215-218 ◽  
Author(s):  
Y. Kaneko ◽  
Y. Hiwatari ◽  
K. Ohara ◽  
T. Murakami
Keyword(s):  
Thin Film ◽  
Computer Simulation ◽  
Defect Formation ◽  
Film Growth ◽  
Thin Film Growth

scholarly journals Computer Simulation Of Thin Film Growth: Applying The Results To Optical Coatings

1984 ◽  
Author(s):  
M. Sikkens ◽  
I. J. Hodgkinson ◽  
F. Horowitz ◽  
H. A. Macleod ◽  
J. J. Wharton
Keyword(s):  
Thin Film ◽  
Computer Simulation ◽  
Film Growth ◽  
Thin Film Growth ◽  
Optical Coatings

A Study on the Computer Simulation for the Fractal Growth of Semiconductor Thin Films

2013 ◽  
Vol 311 ◽  
pp. 451-455
Author(s):  
Liang Wen Ji ◽  
Mei Li Tsai
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Computer Simulation ◽  
Film Growth ◽  
Fractal Theory ◽  
Three Dimensional ◽  
Thin Film Growth ◽  
Physical Parameters ◽  
Traditional Theory ◽  
Semiconductor Thin Films

This paper is based on theoretical methods to study the computer simulation and analysis of the growth of semiconductor thin films. First, according to the traditional theory of thin-film growth, the relationship between the growth morphology and the physical parameters are discussed. Then, fractal theory has been applied to improve the diffusion-limited aggregation (DLA) model. And the simulations of the two-dimensional and three-dimensional thin-film growth are proposed. A computer program of the simulation of the thin-film growth is developed with help of MATLAB. Finally, the results of the simulation of the thin-film growth have been analyzed by the fractal dimension and multifractal spectra. The results of this paper can be applied to the dynamic simulation of nanometer thin-film growth, and an effective simulation tool is to provide the semiconductor process.

scholarly journals Computer Simulation Of Thin Film Growth: Applying The Results To Optical Coatings

1986 ◽  
Vol 25 (1) ◽  
pp. 250142 ◽  
Author(s):  
M. Sikkens ◽  
I. J. Hodgkinson ◽  
F. Horowitz ◽  
H. A. Macleod ◽  
J. J. Wharton
Keyword(s):  
Thin Film ◽  
Computer Simulation ◽  
Film Growth ◽  
Thin Film Growth ◽  
Optical Coatings
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