An Overview of New Concepts Deduced from Interball Solar Wind Investigations

ABSTRACTSaturn's broad E ring, the narrow G ring and the structured and apparently time variable F ring(s), contain many micron and sub-micron sized particles, which make up the “visible” component. These rings (or ring systems) are in direct contact with magnetospheric plasma. Fluctuations in the plasma density and/or mean energy, due to magnetospheric and solar wind processes, may induce stochastic charge variations on the dust particles, which in turn lead to an orbit perturbation and spatial diffusion. It is suggested that the extent of the E ring and the braided, kinky structure of certain portions of the F rings as well as possible time variations are a result of plasma induced electromagnetic perturbations and drag forces. The G ring, in this scenario, requires some form of shepherding and should be akin to the F ring in structure. Sputtering of micron-sized dust particles in the E ring by magnetospheric ions yields lifetimes of 102to 104years. This effect as well as the plasma induced transport processes require an active source for the E ring, probably Enceladus.

Download Full-text

Quantitative surface damage studies by H.R.E.M.

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010015513x ◽

1989 ◽

Vol 47 ◽

pp. 632-633

Author(s):

S. R. Singh ◽

H. J. Fan ◽

L. D. Marks

Keyword(s):

Solar Wind ◽

Quantitative Analysis ◽

Surface Science ◽

Surface Damage ◽

Space Environment ◽

Oxygen Desorption ◽

The Past ◽

Diffusion Controlled ◽

Original Observation ◽

Substantial Interest

Since the original observation that the surfaces of materials undergo radiation damage in the electron microscope similar to that observed by more conventional surface science techniques there has been substantial interest in understanding these phenomena in more detail; for a review see. For instance, surface damage in a microscope mimics damage in the space environment due to the solar wind and electron beam lithographic operations.However, purely qualitative experiments that have been done in the past are inadequate. In addition, many experiments performed in conventional microscopes may be inaccurate. What is needed is careful quantitative analysis including comparisons of the behavior in UHV versus that in a conventional microscope. In this paper we will present results of quantitative analysis which clearly demonstrate that the phenomena of importance are diffusion controlled; more detailed presentations of the data have been published elsewhere.As an illustration of the results, Figure 1 shows a plot of the shrinkage of a single, roughly spherical particle of WO3 versus time (dose) driven by oxygen desorption from the surface.

Download Full-text

Novel Approaches to Low-Voltage Scanning Electron Microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100180586 ◽

1990 ◽

Vol 48 (1) ◽

pp. 366-367

Author(s):

Arthur V. Jones

Keyword(s):

Electron Microscopy ◽

Scanning Electron Microscopy ◽

Low Voltage ◽

Electron Optics ◽

Current Interest ◽

New Concepts ◽

Opportune Time ◽

Novel Approaches ◽

Voltage Scanning ◽

Scanning Electron

In comparison with the developers of other forms of instrumentation, scanning electron microscope manufacturers are among the most conservative of people. New concepts usually must wait many years before being exploited commercially. The field emission gun, developed by Albert Crewe and his coworkers in 1968 is only now becoming widely available in commercial instruments, while the innovative lens designs of Mulvey are still waiting to be commercially exploited. The associated electronics is still in general based on operating procedures which have changed little since the original microscopes of Oatley and his co-workers.The current interest in low-voltage scanning electron microscopy will, if sub-nanometer resolution is to be obtained in a useable instrument, lead to fundamental changes in the design of the electron optics. Perhaps this is an opportune time to consider other fundamental changes in scanning electron microscopy instrumentation.

Download Full-text