Theory of Ion-Induced Kinetic Electron Emission from Solids

1993 ◽  
pp. 27-58 ◽  
Author(s):  
Max Rösler
Keyword(s):  
Electron Emission

Historical Introduction

1977 ◽  
Vol 35 ◽  
pp. 2-5
Author(s):  
R. D. Heidenreich
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
50Th Anniversary ◽  
Secondary Emission ◽  
Wave Nature ◽  
Nobel Prize In Physics ◽  
Primary Electrons ◽  
The U.S ◽  
Mutual Agreement

This program has been organized by the EMSA to commensurate the 50th anniversary of the experimental verification of the wave nature of the electron. Davisson and Germer in the U.S. and Thomson and Reid in Britian accomplished this at about the same time. Their findings were published in Nature in 1927 by mutual agreement since their independent efforts had led to the same conclusion at about the same time. In 1937 Davisson and Thomson shared the Nobel Prize in physics for demonstrating the wave nature of the electron deduced in 1924 by Louis de Broglie.The Davisson experiments (1921-1927) were concerned with the angular distribution of secondary electron emission from nickel surfaces produced by 150 volt primary electrons. The motivation was the effect of secondary emission on the characteristics of vacuum tubes but significant deviations from the results expected for a corpuscular electron led to a diffraction interpretation suggested by Elasser in 1925.

SEM and Auger microanalysis studies of Cu-Be dynode surfaces at each activation condition

1978 ◽  
Vol 36 (1) ◽  
pp. 524-525
Author(s):  
T. Koshikawa ◽  
Y. Fujii ◽  
E. Sugata ◽  
F. Kanematsu
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Life Time ◽  
Activation Process ◽  
Beam Diameter ◽  
Activation Temperature ◽  
Electron Multiplier ◽  
Activation Condition ◽  
Activation Conditions

The Cu-Be alloys are widely used as the electron multiplier dynodes after the adequate activation process. But the structures and compositions of the elements on the activated surfaces were not studied clearly. The Cu-Be alloys are heated in the oxygen atmosphere in the usual activation techniques. The activation conditions, e.g. temperature and O2 pressure, affect strongly the secondary electron yield and life time of dynodes.In the present paper, the activated Cu-Be dynode surfaces at each condition are investigated with Scanning Auger Microanalyzer (SAM) (primary beam diameter: 3μmϕ) and SEM. The commercial Cu-Be(2%) alloys were polished with Cr2O3 powder, rinsed in the distilled water and set in the vacuum furnance.Two typical activation condition, i.e. activation temperature 730°C and 810°C in 5x10-3 Torr O2 pressure were chosen since the formation mechanism of the BeO film on the Cu-Be alloys was guessed to be very different at each temperature from the results of the secondary electron emission measurements.

SEM analysis of DC magnetron sputtered beryllium films

1988 ◽  
Vol 46 ◽  
pp. 960-961
Author(s):  
E. F. Lindsey ◽  
C. W. Price ◽  
E. L. Pierce ◽  
E. J. Hsieh
Keyword(s):  
Fine Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Low Voltage ◽  
Ion Beam ◽  
Secondary Electron Emission ◽  
Sem Analysis ◽  
Fused Silica ◽  
Grain Structure ◽  
Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

ELECTRON EMISSION AT BACKWARD ANGLES FROM He2+, He+(2 MeV) → He, Ne, Ar COLLISION SYSTEMS

1987 ◽  
Vol 48 (C9) ◽  
pp. C9-289-C9-291
Author(s):  
A. KÖVÉR ◽  
G. SZABÓ ◽  
L. GULYÁS ◽  
K. TÖKÉSI ◽  
D. BERÉNYI ◽  
...  
Keyword(s):  
Electron Emission

STATISTICS OF ELECTRON EMISSION FROM METAL SURFACES BOMBARDED BY IONS IN DIFFERENT CHARGE STATES

1989 ◽  
Vol 50 (C1) ◽  
pp. C1-533-C1-539 ◽  
Author(s):  
G. LAKITS ◽  
F. AUMAYR ◽  
H. WINTER
Keyword(s):  
Electron Emission ◽  
Metal Surfaces ◽  
Charge States

Field emission and explosive electron emission processes in vacuum discharges

1983 ◽  
Vol 139 (2) ◽  
pp. 265 ◽  
Author(s):  
E.A. Litvinov ◽  
Gennadii A. Mesyats ◽  
D.I. Proskurovskii
Keyword(s):  
Field Emission ◽  
Electron Emission ◽  
Explosive Electron Emission

TECHALLOY NICKEL 211

Alloy Digest ◽  
1977 ◽  
Vol 26 (8) ◽  
Keyword(s):  
Corrosion Resistance ◽  
Elevated Temperature ◽  
Physical Properties ◽  
Electron Emission ◽  
Heat Treating ◽  
Manganese Alloy ◽  
Temperature Resistance ◽  
Structural Parts ◽  
Nickel 200 ◽  
Nickel Manganese

Abstract TECHALLOY Nickel 211 is a nickel-manganese alloy with good elevated-temperature resistance to corrosion by sulfur compounds. When annealed, it is slightly stronger and harder than Techalloy Nickel 200 and is good for structural parts subjected to degassing temperatures. Nickel 211 has low electron emission and is used for such applications as electron tubes and sparkplug electrodes. This datasheet provides information on composition, physical properties, hardness, elasticity, and tensile properties. It also includes information on corrosion resistance as well as forming, heat treating, machining, joining, and surface treatment. Filing Code: Ni-248. Producer or source: Techalloy Company Inc..

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