Stability of the (110) Face in Noble Metals Analyzed within a Tight-Binding Scheme

1989 ◽  
pp. 361-367 ◽  
Author(s):  
Bernard Legrand ◽  
Michel Guillopé
Keyword(s):  
2018 ◽  
Vol 146 ◽  
pp. 278-286 ◽  
Author(s):  
S. Silayi ◽  
D.A. Papaconstantopoulos ◽  
M.J. Mehl

1994 ◽  
Vol 50 (19) ◽  
pp. 14694-14697 ◽  
Author(s):  
Ronald E. Cohen ◽  
Michael J. Mehl ◽  
Dimitrios A. Papaconstantopoulos

1993 ◽  
Vol 313 ◽  
Author(s):  
P.D. Johnson ◽  
N.B. Brookes ◽  
Y. Chang ◽  
K. Garrison

ABSTRACTSpin polarized photoemission is used to study the electronic structure of noble metals deposited on ferromagnetic substrates. Studies of Ag deposited on an Fe (001) substrate reveal a series of minority spin interface or quantum well states with binding energies dependent on the thickness of the silver. Similar behavior is observed for Cu films deposited on a fee Co (001) substrate. Tight-binding Modeling reproduces many of the observations and shows that hybridization of the sp-bands with the noble metal d-bands cannot be ignored.


Author(s):  
E. I. Alessandrini ◽  
M. O. Aboelfotoh

Considerable interest has been generated in solid state reactions between thin films of near noble metals and silicon. These metals deposited on Si form numerous stable chemical compounds at low temperatures and have found applications as Schottky barrier contacts to silicon in VLSI devices. Since the very first phase that nucleates in contact with Si determines the barrier properties, the purpose of our study was to investigate the silicide formation of the near noble metals, Pd and Pt, at very thin thickness of the metal films on amorphous silicon.Films of Pd and Pt in the thickness range of 0.5nm to 20nm were made by room temperature evaporation on 40nm thick amorphous Si films, which were first deposited on 30nm thick amorphous Si3N4 membranes in a window configuration. The deposition rate was 0.1 to 0.5nm/sec and the pressure during deposition was 3 x 10 -7 Torr. The samples were annealed at temperatures in the range from 200° to 650°C in a furnace with helium purified by hot (950°C) Ti particles. Transmission electron microscopy and diffraction techniques were used to evaluate changes in structure and morphology of the phases formed as a function of metal thickness and annealing temperature.


Author(s):  
L.D. Schmidt ◽  
K. R. Krause ◽  
J. M. Schwartz ◽  
X. Chu

The evolution of microstructures of 10- to 100-Å diameter particles of Rh and Pt on SiO2 and Al2O3 following treatment in reducing, oxidizing, and reacting conditions have been characterized by TEM. We are able to transfer particles repeatedly between microscope and a reactor furnace so that the structural evolution of single particles can be examined following treatments in gases at atmospheric pressure. We are especially interested in the role of Ce additives on noble metals such as Pt and Rh. These systems are crucial in the automotive catalytic converter, and rare earths can significantly modify catalytic properties in many reactions. In particular, we are concerned with the oxidation state of Ce and its role in formation of mixed oxides with metals or with the support. For this we employ EELS in TEM, a technique uniquely suited to detect chemical shifts with ∼30Å resolution.


Sign in / Sign up

Export Citation Format

Share Document