High-voltage pulsed discharge in an electron source with a plasma cathode

1973 ◽  
Vol 16 (10) ◽  
pp. 1437-1440
Author(s):  
S. P. Bugaev ◽  
F. Ya. Zagulov
Keyword(s):  
High Voltage ◽  
Electron Source ◽  
Pulsed Discharge ◽  
Plasma Cathode

scholarly journals Sterilization of dielectric containers using a fore-vacuum pressure plasma-cathode electron source

2015 ◽  
Vol 652 ◽  
pp. 012044 ◽  
Author(s):  
D Zolotukhin ◽  
V Burdovitsini ◽  
E Oks ◽  
A Tyunkov ◽  
Yu Yushkov
Keyword(s):  
Electron Source ◽  
Vacuum Pressure ◽  
Plasma Cathode ◽  
Pressure Plasma

Quantitative analysis of oxidative DNA damage induced by high-voltage pulsed discharge with cavitation

2015 ◽  
Vol 73 ◽  
pp. 131-139 ◽  
Author(s):  
Ken-ichi Kudo ◽  
Hironori Ito ◽  
Satoshi Ihara ◽  
Hiroaki Terato
Keyword(s):  
Dna Damage ◽  
Quantitative Analysis ◽  
High Voltage ◽  
Oxidative Dna Damage ◽  
Pulsed Discharge

Double-coil magnetic focusing of the electron beam generated by a plasma-cathode electron source

2019 ◽  
Vol 90 (2) ◽  
pp. 023302 ◽  
Author(s):  
I. Yu. Bakeev ◽  
A. S. Klimov ◽  
E. M. Oks ◽  
A. A. Zenin
Keyword(s):  
Electron Beam ◽  
Electron Source ◽  
Plasma Cathode ◽  
Magnetic Focusing

scholarly journals Forevacuum plasma source of continuous electron beam

2019 ◽  
Vol 37 (2) ◽  
pp. 203-208 ◽  
Author(s):  
Aleksandr Klimov ◽  
Ilya Bakeev ◽  
Efim Oks ◽  
Aleksey Zenin
Keyword(s):  
Electron Beam ◽  
Power Density ◽  
Hollow Cathode ◽  
Plasma Source ◽  
Electron Source ◽  
Hollow Cathode Discharge ◽  
Maximum Power ◽  
Maximum Power Density ◽  
Plasma Cathode ◽  
Pressure Plasma

AbstractWe describe here the design, main parameters, and characteristics of a forevacuum-pressure plasma-cathode electron source based on a hollow-cathode discharge. The source generates a continuous focused electron beam with energy up to 30 keV and current up to 300 mA at a pressure of 10–50 Pa. The focused electron beam reaches a maximum power density of 106 W/cm2. The source utility has been demonstrated by its application for processing and cutting of ceramic.

A Plasma-Cathode Electron Source for Focused-Beam Generation in the Fore-Pump Pressure Range

2005 ◽  
Vol 48 (6) ◽  
pp. 761-763 ◽  
Author(s):  
V. A. Burdovitsin ◽  
I. S. Zhirkov ◽  
E. M. Oks ◽  
I. V. Osipov ◽  
M. V. Fedorov
Keyword(s):  
Pressure Range ◽  
Electron Source ◽  
Plasma Cathode ◽  
Beam Generation ◽  
Pump Pressure ◽  
Focused Beam

Prediction of the stability and electronic properties of carbon nanotori synthesized by a high-voltage pulsed discharge in ethanol vapor

2016 ◽  
Vol 50 (4) ◽  
pp. 502-507 ◽  
Author(s):  
O. E. Glukhova ◽  
V. A. Kondrashov ◽  
V. K. Nevolin ◽  
I. I. Bobrinetsky ◽  
G. V. Savostyanov ◽  
...  
Keyword(s):  
Electronic Properties ◽  
High Voltage ◽  
Ethanol Vapor ◽  
Pulsed Discharge ◽  
The Stability
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