A model for surface-relief formation in azobenzene polymers

Atomic force microscopy (AFM) and focused ion beam technique (FIB) were adopted to study the early stages of surface relief evolution in 316L steel and polycrystalline copper fatigued with constant plastic strain amplitudes at different temperatures (316L steel at 93, 173 and 573 K; copper at 83, 173 and 295 K). Qualitative and quantitative data on the morphology and shape of persistent slip markings (PSMs), occurrence of extrusions and intrusions and the kinetics of extrusion growth are reported. They are discussed in relation with recent physically based theories of surface relief formation leading to fatigue crack initiation.

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Formation of Direct Surface Relief in Photochrome-Chalcogenide Composites

Latvian Journal of Physics and Technical Sciences ◽

10.2478/v10047-010-0007-0 ◽

2010 ◽

Vol 47 (2) ◽

pp. 49-59

Author(s):

A. Gerbreders ◽

J. Teteris

Keyword(s):

Surface Relief ◽

Composite Films ◽

Film Surface ◽

Organic Polymer ◽

Holographic Recording ◽

Relief Formation ◽

Induced Changes ◽

Quartz Substrates ◽

532 Nm ◽

Transmission And Reflection

Formation of Direct Surface Relief in Photochrome-Chalcogenide CompositesA method for preparation of thin triple composite films of organic polymer-chalcogenide-photochromes is described, the photo-induced changes of optical properties and holographic recording are considered. The films were obtained from solutions of arsenic sulphide, azobenzene Disperse Red 1, spiropyran, and organic polymers in organic solvents. The solutions were spread over glass or quartz substrates; the thickness of dry films was 3-10 μm. The absorption spectra of the prepared films were studied and analyzed. The holographic recording of diffraction gratings was performed by laser lines of 325 nm, 442 nm and 532 nm. During recording the diffraction efficiency was measured simultaneously in the transmission and reflection modes. The relief formation on the film surface was observed and the profile of the gratings formed was analyzed using AFM microscope. The influence of photoisomerization and photo-induced mass transport on the surface relief formation process is discussed.

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Molecularly oriented surface relief formation in polymethacrylates comprisingN-benzylideneaniline derivative side groups

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.128002 ◽

2014 ◽

Vol 53 (12) ◽

pp. 128002 ◽

Cited By ~ 2

Author(s):

Nobuhiro Kawatsuki ◽

Risa Hosoda ◽

Mizuho Kondo ◽

Tomoyuki Sasaki ◽

Hiroshi Ono

Keyword(s):

Surface Relief ◽

Oriented Surface ◽

Relief Formation

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Highly Efficient Surface Relief Formation via Photoembossing of a Supramolecular Polymer

Macromolecular Chemistry and Physics ◽

10.1002/macp.200800355 ◽

2008 ◽

Vol 209 (20) ◽

pp. 2094-2099 ◽

Cited By ~ 16

Author(s):

Ko Hermans ◽

Itsuro Tomatsu ◽

Michael Matecki ◽

Rint P. Sijbesma ◽

Cees W. M. Bastiaansen ◽

...

Keyword(s):

Surface Relief ◽

Supramolecular Polymer ◽

Highly Efficient ◽

Relief Formation

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Surface relief grating formation in amorphous As40S15Se45 and As2S3 films under 0.532 μm wavelength illumination

Canadian Journal of Physics ◽

10.1139/cjp-2013-0599 ◽

2014 ◽

Vol 92 (7/8) ◽

pp. 659-662 ◽

Cited By ~ 1

Author(s):

Mara Reinfelde ◽

Janis Teteris ◽

Elina Potanina

Keyword(s):

Surface Relief ◽

Laser Light ◽

Grating Period ◽

Sample Thickness ◽

Light Illumination ◽

Surface Relief Grating ◽

Wide Range ◽

Relief Formation ◽

The Impact ◽

Grating Formation

In this research we have studied the influence of λ = 0.532 μm laser light illumination on the formation and properties of surface relief gratings in amorphous As2S3 and As40Se15Se45 films, as well as a bulk As2S3 sample. The surface relief grating formation was studied for a wide range of grating periods (∼1 – ∼80 μm) for the variable thicknesses of the samples. The examination of the relief depth, Δh, and its dependence on the grating period at constant exposures shows that the impact of sample thickness could manifest itself as a shift in the optimal grating period at holographic surface relief formation (As2S3) and affect the process itself.

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