Preparation and characterisation of chromium-doped cobalt oxide spinel thin films

2011 ◽  
Vol 47 (3) ◽  
pp. 1348-1353 ◽  
Author(s):  
V. Vannier ◽  
M. Schenk ◽  
K. Kohse-Höinghaus ◽  
N. Bahlawane
Keyword(s):  
2021 ◽  
Vol 127 (7) ◽  
Author(s):  
Ayse Kucukarslan ◽  
Esra Kus ◽  
Emrah Sarica ◽  
Idris Akyuz ◽  
Vildan Bilgin ◽  
...  

2011 ◽  
Vol 257 (8) ◽  
pp. 3358-3362 ◽  
Author(s):  
Shijing Wang ◽  
Boping Zhang ◽  
Cuihua Zhao ◽  
Songjie Li ◽  
Meixia Zhang ◽  
...  

2016 ◽  
Vol 30 (27) ◽  
pp. 1650343 ◽  
Author(s):  
S. Kerli

The cobalt oxide and boron-doped cobalt oxide thin films were produced by spray deposition method. All films were obtained onto glass and fluorine-doped tin oxide (FTO) substrates at 400[Formula: see text]C and annealed at 550[Formula: see text]C. We present detailed analysis of the morphological and optical properties of films. XRD results show that boron doping disrupts the structure of the films. Morphologies of the films were investigated by using a scanning electron microscopy (SEM). Optical measurements indicate that the band gap energies of the films change with boron concentrations. The electrochemical supercapacitor performance test has been studied in aqueous 6 M KOH electrolyte and with scan rate of 5 mV/s. Measurements show that the largest capacitance is obtained for 3% boron-doped cobalt oxide film.


2017 ◽  
Vol 1 (2) ◽  
Author(s):  
Q. Q. Lan ◽  
X. J. Zhang ◽  
X. Shen ◽  
H. W. Yang ◽  
H. R. Zhang ◽  
...  

2001 ◽  
Vol 15 (17) ◽  
pp. 1621-1624 ◽  
Author(s):  
Simona Barison ◽  
Davide Barreca ◽  
Sergio Daolio ◽  
Monica Fabrizio ◽  
Eugenio Tondello

2016 ◽  
Vol 16 (11) ◽  
pp. 11839-11842
Author(s):  
Dongbin Kim ◽  
Ki-Min Roh ◽  
Jihun Mun ◽  
Yinhua Jin ◽  
Sang Jun Lee ◽  
...  

2004 ◽  
Vol 566-568 ◽  
pp. 471-475 ◽  
Author(s):  
S. Sindhu ◽  
M. Heiler ◽  
K.-M. Schindler ◽  
W. Widdra ◽  
H. Neddermeyer

2021 ◽  
Vol 400 (1) ◽  
pp. 2100125
Author(s):  
Charudatta S. Pawar ◽  
A. T. Yadav ◽  
S. P. Salunkhe

2020 ◽  
Vol 8 (28) ◽  
pp. 13955-13963 ◽  
Author(s):  
Fan Yang ◽  
Xinghao Zhou ◽  
Noah T. Plymale ◽  
Ke Sun ◽  
Nathan S. Lewis

Thin films of nickel oxide (NiOx), cobalt oxide (CoOx) and nickel–cobalt oxide (NiCoOx) produced integrated, protected Si (111) photoanodes integrated, protected Si photoanodes that did not require deposition of a separate heterogeneous electrocatalyst for water oxidation.


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