Effects of Ar+ irradiation on the performance of memristor based on single-crystalline LiNbO3 thin film

Author(s):  
Qin Xie ◽  
Xinqiang Pan ◽  
Wenbo Luo ◽  
Yao Shuai ◽  
Chuangui Wu ◽  
...  
Keyword(s):  
AIP Advances ◽  
2020 ◽  
Vol 10 (7) ◽  
pp. 075002
Author(s):  
Xiaoyuan Bai ◽  
Yao Shuai ◽  
Lu Lv ◽  
Ying Xing ◽  
Jiaoling Zhao ◽  
...  

2010 ◽  
Vol 31 (5) ◽  
pp. 422-424 ◽  
Author(s):  
William Hsu ◽  
Cheng-Yi Peng ◽  
Cheng-Ming Lin ◽  
Yen-Yu Chen ◽  
Yen-Ting Chen ◽  
...  

2018 ◽  
Vol 501 ◽  
pp. 27-33 ◽  
Author(s):  
Lipeng Han ◽  
Cai Liu ◽  
Lili Wu ◽  
Jingquan Zhang
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2019 ◽  
Vol 11 (39) ◽  
pp. 35863-35870
Author(s):  
Lin Du ◽  
Donglin Lu ◽  
Jie Li ◽  
Ke Yang ◽  
Lingling Yang ◽  
...  

2002 ◽  
Vol 747 ◽  
Author(s):  
K. Nomura ◽  
H. Ohta ◽  
K. Ueda ◽  
T. Kamiya ◽  
M. Hirano ◽  
...  

ABSTRACTTransparent metal-insulator-semiconductor field-effect transistors (MISFETs) were fabricated using a single-crystalline thin film of an n-type transparent oxide semiconductor, a homologous compound InGaO3(ZnO)5, grown by a reactive solid phase epitaxy method. The transparent MISFET exhibited good performances with “normally-off characteristics”, “an on/off current ratio as large as 105” and “insensitivity to visible light”. Field-effect mobility was about 2 cm2(Vs)-1, which is larger than those reported previously for MISFETs fabricated in transparent oxide semiconductors. These improved performance is thought to result from the low defect density and intrinsic-level carrier concentration of the single-crystalline InGaO3(ZnO)5 film.


1992 ◽  
Vol 42-44 ◽  
pp. 715-720 ◽  
Author(s):  
H.P. Lang ◽  
J.P. Ramseyer ◽  
D. Brodbeck ◽  
T. Frey ◽  
J. Karpinski ◽  
...  

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