Plasma Characteristics and Antenna Electrical Characteristics of an Internal Linear Inductively Coupled Plasma Source with a Multi-Polar Magnetic Field

2007 ◽  
Vol 28 (1) ◽  
pp. 147-158 ◽  
Author(s):  
Kyong Nam Kim ◽  
Jong Hyeuk Lim ◽  
Jung Kyun Park ◽  
Geun Young Yeom ◽  
Sung Hee Lee ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Electrical Characteristics ◽  
Inductively Coupled ◽  
Polar Magnetic Field ◽  
Plasma Characteristics

Frequency dependence of plasma characteristics at different pressures in cylindrical inductively coupled plasma source

2019 ◽  
Vol 21 (7) ◽  
pp. 075401 ◽  
Author(s):  
Zeyu HAO ◽  
Jian SONG ◽  
Yue HUA ◽  
Gailing ZHANG ◽  
Xiaodong BAI ◽  
...  
Keyword(s):  
Frequency Dependence ◽  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Inductively Coupled ◽  
Plasma Characteristics

Influence of a centered dielectric tube on inductively coupled plasma source: Chamber structures and plasma characteristics

2017 ◽  
Vol 26 (7) ◽  
pp. 075203
Author(s):  
Zhen-Hua Bi ◽  
Yi Hong ◽  
Guang-Jiu Lei ◽  
Shuai Wang ◽  
You-Nian Wang ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Dielectric Tube ◽  
Inductively Coupled ◽  
Plasma Characteristics

Plasma Characteristics of 450 mm Diameter Ferrite-Enhanced Inductively Coupled Plasma Source

2010 ◽  
Vol 49 (8) ◽  
pp. 080217 ◽  
Author(s):  
Seung Pyo Hong ◽  
Jong Hyeuk Lim ◽  
Gwang Ho Gweon ◽  
Geun Young Yeom
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Source ◽  
Inductively Coupled ◽  
Plasma Characteristics

Characteristics of Inductive Coupled Plasma with Internal Linear Antenna Using Multi-Polar Magnetic Field for FPD Processing

2007 ◽  
Vol 124-126 ◽  
pp. 271-274
Author(s):  
Jong Hyeuk Lim ◽  
Kyong Nam Kim ◽  
Geun Young Yeom
Keyword(s):  
Magnetic Field ◽  
Permanent Magnets ◽  
Impedance Matching ◽  
Plasma Source ◽  
Q Factor ◽  
Rf Power ◽  
Large Area ◽  
Plasma System ◽  
Polar Magnetic Field ◽  
Plasma Characteristics

An internal linear inductive antenna referred to as “double comb-type antenna” was used for a large-area plasma source with the substrate area of 880mm × 660mm and the effects of multi-polar magnetic field applied by inserting permanent magnets parallel to the linear internal antennas on the plasma characteristics were investigated. By applying the multi-polar magnetic field, high density plasmas on the order of 3.2 × 1011-3 which is 50% higher than that obtained for the source without multi-polar magnetic field could be obtained at the RF power of 5000W. Also stable impedance matching with a low Q-factor of the plasma system could be obtained. The application of the multi-polar magnetic field not only increased the plasma density but also improved the plasma uniformity (less than 3%) within the 880mm × 660mm processing area.

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