scholarly journals Sediment generation and soil mound denudation in areas of high-density tree throw along a river valley in the Jura Mountains, Switzerland

2021 ◽  
Vol 18 (2) ◽  
pp. 377-391
Author(s):  
Philip Greenwood ◽  
Jan Bauer ◽  
Nikolaus J. Kuhn
Keyword(s):  
River Valley ◽  
High Density ◽  
Jura Mountains ◽  
Soil Mound

scholarly journals Cotton N rate could be reduced further under the planting model of late sowing and high-density in the Yangtze River valley

2020 ◽  
Vol 3 (1) ◽  
Author(s):  
Xinghu SONG ◽  
Ying HUANG ◽  
Yuan YUAN ◽  
Atta Tung SHAHBAZ ◽  
Souliyanonh BIANGKHAM ◽  
...  
Keyword(s):  
Yangtze River ◽  
Block Design ◽  
Yangtze River Valley ◽  
River Valley ◽  
High Density ◽  
Cropping Pattern ◽  
The Yangtze River ◽  
Cotton Yield ◽  
N Rates ◽  
Late Sowing

Abstract Background An optimal N rate is one of the basic determinants for high cotton yield. The purpose of this study was to determine the optimal N rate on a new cotton cropping pattern with late-sowing, high density and one-time fertilization at the first flower period in Yangtze River Valley, China. A 2-year experiment was conducted in 2015 and 2016 with a randomized complete block design. The cotton growth process, yield, and biomass accumulation were examined. Results The results showed that N rates had no effect on cotton growing progress or periods. Cotton yield was increased with N rates increasing from 120 to 180 kg·hm−2, while the yield was not increased when the N rate was beyond 180 kg·hm−2, or even decreased (9∼29%). Cotton had the highest biomass at the N rate of 180 kg·hm−2 is due to its highest accumulation speed during the fast accumulation period. Conclusions The result suggests that the N rate for cotton could be reduced further to be 180 kg·hm− 2 under the new cropping pattern in the Yangtze River Valley, China.

scholarly journals Cotton N rate could be reduced further under the planting model of late sowing and high-density in Yangtze River Valley

2020 ◽  
Author(s):  
xinghu song ◽  
Ying Huang ◽  
Yuan Yuan ◽  
Shahbaz Atta Tung ◽  
Biangkham Souliyanonh ◽  
...  
Keyword(s):  
Yangtze River ◽  
Growth Process ◽  
Biomass Accumulation ◽  
Yangtze River Valley ◽  
River Valley ◽  
High Density ◽  
Cropping Pattern ◽  
Cotton Yield ◽  
Process Yield ◽  
Late Sowing

Abstract Background: An optimal N rate is one of the basic determinants for high cotton yield. The purpose of this study was to determine the optimal N rate on a new cotton cropping pattern with late-sowing, high density and one-time fertilization at first flower in Yangtze River Valley China. A 2-year experiment was conducted in 2015 and 2016 with a randomized complete blocks design, and cotton growth process, yield and biomass accumulation were examined. Results: The results showed that N rate had no effect on cotton growing progress or periods. Cotton yield was increased with N rate increasing from 120-180 kg·hm-2, while the yield was not increased when N was beyond 180 kg·hm-2, or even decreased (9-29%). Cotton had the highest biomass at N180 due to its highest accumulation speed during the fast accumulation period (FAP). Conclusions: The result suggests that cotton N rate could be reduced further to be 180 kg·hm-2 under the new cropping pattern in Yangtze River Valley China.

scholarly journals Cotton N rate could be reduced further under the planting model of late sowing and high-density in Yangtze River Valley

2020 ◽  
Author(s):  
xinghu song ◽  
Ying Huang ◽  
Yuan Yuan ◽  
Shahbaz Atta Tung ◽  
Biangkham Souliyanonh ◽  
...  
Keyword(s):  
Yangtze River ◽  
Growth Process ◽  
Biomass Accumulation ◽  
Yangtze River Valley ◽  
River Valley ◽  
High Density ◽  
Cropping Pattern ◽  
Cotton Yield ◽  
Process Yield ◽  
Late Sowing

Abstract Background An optimal N rate is one of the basic determinants for high cotton yield. The purpose of this study was to determine the optimal N rate on a new cotton cropping pattern with late-sowing, high density and one-time fertilization at first flower in Yangtze River Valley China. A 2-year experiment was conducted in 2015 and 2016 with a randomized complete blocks design, and cotton growth process, yield and biomass accumulation were examined. Results The results showed that N rate had no effect on cotton growing progress or periods. Cotton yield was increased with N rate increasing from 120–180 kg ha− 1, while the yield was not increased when N was beyond 180 kg ha− 1, or even decreased (9–29%). Cotton had the highest biomass at N180 due to its highest accumulation speed during the fast accumulation period (FAP). Conclusions The result suggests that cotton N rate could be reduced further to be 180 kg ha− 1 under the new cropping pattern in Yangtze River Valley China.

Planar defects in ordered (Ga,In)P

1988 ◽  
Vol 46 ◽  
pp. 902-903
Author(s):  
S. McKernan ◽  
C. B. Carter ◽  
D. Bour ◽  
J. R. Shealy
Keyword(s):  
Electron Diffraction ◽  
Vapor Phase ◽  
Growth Direction ◽  
High Density ◽  
Ordered Structure ◽  
Planar Defects ◽  
Diffraction Patterns ◽  
Ternary Semiconductors ◽  
Anion Species ◽  
Metallic Vapor

The growth of ternary III-V semiconductors by organo-metallic vapor phase epitaxy (OMVPE) is widely practiced. It has been generally assumed that the resulting structure is the same as that of the corresponding binary semiconductors, but with the two different cation or anion species randomly distributed on their appropriate sublattice sites. Recently several different ternary semiconductors including AlxGa1-xAs, Gaxln-1-xAs and Gaxln1-xP1-6 have been observed in ordered states. A common feature of these ordered compounds is that they contain a relatively high density of defects. This is evident in electron diffraction patterns from these materials where streaks, which are typically parallel to the growth direction, are associated with the extra reflections arising from the ordering. However, where the (Ga,ln)P epilayer is reasonably well ordered the streaking is extremely faint, and the intensity of the ordered spot at 1/2(111) is much greater than that at 1/2(111). In these cases it is possible to image relatively clearly many of the defects found in the ordered structure.

Quantitative defect studies in semiconductor TEM samples prepared by low angle ion milling

1995 ◽  
Vol 53 ◽  
pp. 512-513
Author(s):  
L. Mulestagno ◽  
J.C. Holzer ◽  
P. Fraundorf
Keyword(s):  
Sample Preparation ◽  
Milling Time ◽  
High Density ◽  
Low Density ◽  
Ion Milling ◽  
High Quality ◽  
Variable Angle ◽  
Major Disadvantage ◽  
Induced Defects

Due to the wealth of information, both analytical and structural that can be obtained from it TEM always has been a favorite tool for the analysis of process-induced defects in semiconductor wafers. The only major disadvantage has always been, that the volume under study in the TEM is relatively small, making it difficult to locate low density defects, and sample preparation is a somewhat lengthy procedure. This problem has been somewhat alleviated by the availability of efficient low angle milling.Using a PIPS® variable angle ion -mill, manufactured by Gatan, we have been consistently obtaining planar specimens with a high quality thin area in excess of 5 × 104 μm2 in about half an hour (milling time), which has made it possible to locate defects at lower densities, or, for defects of relatively high density, obtain information which is statistically more significant (table 1).

Using the scanning electron microscope for failure analysis of high density magnetic media

1987 ◽  
Vol 45 ◽  
pp. 392-393
Author(s):  
Evelyn R. Ackerman ◽  
Gary D. Burnett
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Failure Analysis ◽  
High Density ◽  
Magnetic Media ◽  
Specific Data ◽  
Retrieval Systems ◽  
Operating Environments ◽  
The Media ◽  
Scanning Electron

Advancements in state of the art high density Head/Disk retrieval systems has increased the demand for sophisticated failure analysis methods. From 1968 to 1974 the emphasis was on the number of tracks per inch. (TPI) ranging from 100 to 400 as summarized in Table 1. This emphasis shifted with the increase in densities to include the number of bits per inch (BPI). A bit is formed by magnetizing the Fe203 particles of the media in one direction and allowing magnetic heads to recognize specific data patterns. From 1977 to 1986 the tracks per inch increased from 470 to 1400 corresponding to an increase from 6300 to 10,800 bits per inch respectively. Due to the reduction in the bit and track sizes, build and operating environments of systems have become critical factors in media reliability.Using the Ferrofluid pattern developing technique, the scanning electron microscope can be a valuable diagnostic tool in the examination of failure sites on disks.

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