Determination of the optical parameters of a-Si:H thin films deposited by hot wire–chemical vapour deposition technique using transmission spectrum only

NABEEL A BAKR; A M FUNDE; V S WAMAN; M M KAMBLE; R R HAWALDAR; D P AMALNERKAR; S W GOSAVI; S R JADKAR

doi:10.1007/s12043-011-0024-4

Determination of the optical parameters of a-Si:H thin films deposited by hot wire–chemical vapour deposition technique using transmission spectrum only

Pramana ◽

10.1007/s12043-011-0024-4 ◽

2011 ◽

Vol 76 (3) ◽

pp. 519-531 ◽

Cited By ~ 77

Author(s):

NABEEL A BAKR ◽

A M FUNDE ◽

V S WAMAN ◽

M M KAMBLE ◽

R R HAWALDAR ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Transmission Spectrum ◽

Vapour Deposition ◽

Chemical Vapour ◽

Optical Parameters ◽

Hot Wire ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique

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Improved stability of intrinsic nanocrystalline Si thin films deposited by hot-wire chemical vapour deposition technique

Thin Solid Films ◽

10.1016/j.tsf.2007.03.051 ◽

2007 ◽

Vol 515 (20-21) ◽

pp. 8040-8044 ◽

Cited By ~ 14

Author(s):

S. Halindintwali ◽

D. Knoesen ◽

R. Swanepoel ◽

B.A. Julies ◽

C. Arendse ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Hot Wire ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique ◽

Improved Stability ◽

Nanocrystalline Si

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Synthesis of nanocrystalline silicon thin films using the increase of the deposition pressure in the hot-wire chemical vapour deposition technique

South African Journal of Science ◽

10.4102/sajs.v105i7/8.79 ◽

2010 ◽

Vol 105 (7/8) ◽

Cited By ~ 2

Author(s):

S. Halindintwali ◽

D. Knoesen ◽

R. Swanepoel ◽

B.A. Julies ◽

C. Arendse ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Nanocrystalline Silicon ◽

Hot Wire ◽

Deposition Technique ◽

Deposition Pressure ◽

Silicon Thin Films ◽

Chemical Vapour Deposition Technique

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Effect of rapid thermal annealing time on Au/SiOx film prepared by hot wire assisted plasma enhanced chemical vapour deposition technique

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2013.02.025 ◽

2013 ◽

Vol 140 (1) ◽

pp. 37-41 ◽

Cited By ~ 3

Author(s):

Kee Wah Chan ◽

Saadah Abdul Rahman ◽

Zarina Aspanut

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Chemical Vapour Deposition ◽

Annealing Time ◽

Vapour Deposition ◽

Chemical Vapour ◽

Hot Wire ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique

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Nanostructured silicon carbon thin films grown by plasma enhanced chemical vapour deposition technique

Thin Solid Films ◽

10.1016/j.tsf.2013.03.073 ◽

2013 ◽

Vol 543 ◽

pp. 27-31 ◽

Cited By ~ 2

Author(s):

U. Coscia ◽

G. Ambrosone ◽

D.K. Basa ◽

V. Rigato ◽

S. Ferrero ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Technique ◽

Nanostructured Silicon ◽

Silicon Carbon ◽

Chemical Vapour Deposition Technique ◽

Carbon Thin Films

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Bias enhanced deposition of highly oriented β-SiC thin films using low pressure hot filament chemical vapour deposition technique

Thin Solid Films ◽

10.1016/s0040-6090(02)00789-7 ◽

2002 ◽

Vol 419 (1-2) ◽

pp. 114-117 ◽

Cited By ~ 19

Author(s):

V.C George ◽

A Das ◽

M Roy ◽

A.K Dua ◽

P Raj ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique ◽

Hot Filament

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Role of chamber pressure on crystallinity and composition of silicon films using silane and methane as precursors in hot-wire chemical vapour deposition technique

Thin Solid Films ◽

10.1016/j.tsf.2019.04.038 ◽

2019 ◽

Vol 682 ◽

pp. 126-130

Author(s):

Ramakrishna Madaka ◽

Juhi Kumari ◽

Venkanna Kanneboina ◽

Himanshu S. Jha ◽

Pratima Agarwal

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Silicon Films ◽

Chamber Pressure ◽

Hot Wire ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique

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Structure and Properties of Diamond Thin Films Grown by Hot-Filament Chemical Vapour Deposition Technique

IETE Technical Review ◽

10.1080/02564602.1998.11416735 ◽

1998 ◽

Vol 15 (1-2) ◽

pp. 99-103

Author(s):

Nita Dilawar ◽

V D Vankar

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Structure And Properties ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique ◽

Diamond Thin Films ◽

Hot Filament

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Structure of diamond and diamond like carbon thin films grown by hot-filament chemical vapour deposition technique

Bulletin of Materials Science ◽

10.1007/bf02744818 ◽

1996 ◽

Vol 19 (3) ◽

pp. 467-473 ◽

Cited By ~ 3

Author(s):

Nita Dilawar ◽

Somna Sah ◽

B R Mehta ◽

V D Vankar

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Diamond Like Carbon ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique ◽

Carbon Thin Films ◽

Hot Filament

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Deposition of cobalt and nickel sulfide thin films from thio- and alkylthio-urea complexes as precursors via the aerosol assisted chemical vapour deposition technique

Thin Solid Films ◽

10.1016/j.tsf.2014.04.086 ◽

2014 ◽

Vol 564 ◽

pp. 51-57 ◽

Cited By ~ 19

Author(s):

L.P. Mgabi ◽

B.S. Dladla ◽

M.A. Malik ◽

Shivram S. Garje ◽

J. Akhtar ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Nickel Sulfide ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique ◽

Cobalt And Nickel

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Nd2O3 thin films deposited by a new chemical vapour deposition technique

Thin Solid Films ◽

10.1016/0040-6090(90)90512-c ◽

1990 ◽

Vol 186 (1) ◽

pp. L1-L5 ◽

Cited By ~ 14

Author(s):

M. Langlet ◽

R.D. Shannon

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Technique ◽

Chemical Vapour Deposition Technique

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