Role of chamber pressure on crystallinity and composition of silicon films using silane and methane as precursors in hot-wire chemical vapour deposition technique
2013 ◽
Vol 140
(1)
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pp. 37-41
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1997 ◽
Vol 76
(3)
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pp. 259-272
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2007 ◽
Vol 515
(20-21)
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pp. 8040-8044
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2009 ◽
Vol 2
(1/2/3/4/5)
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pp. 110
2004 ◽
Vol 16
(1)
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pp. 162-166
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