Investigation of structure, optical, nonlinear optical, dielectrical properties and electronic results of La0.01Ba0.99TiO3, Sm0.5Sr0.5CoO3 and Sm0.5Sr0.5CoO3/La0.01Ba0.99TiO3 thin films grown on quartz substrates using pulsed laser deposition (PLD) technique

2021 ◽  
Author(s):  
A. Abdel Moez ◽  
Y. S. Kim ◽  
Ahmed I. Ali
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Nonlinear Optical ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Dielectrical Properties ◽  
Quartz Substrates

Pulsed laser deposition of oriented V2O5 thin films

2000 ◽  
Vol 15 (10) ◽  
pp. 2249-2265 ◽  
Author(s):  
Jeanne M. McGraw ◽  
John D. Perkins ◽  
Falah Hasoon ◽  
Philip A. Parilla ◽  
Chollada Warmsingh ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Oxygen Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Glass Substrates ◽  
Wide Range ◽  
Phase Pure ◽  
Amorphous Quartz ◽  
Quartz Substrates

We have found that by varying only the substrate temperature and oxygen pressure five different crystallographic orientations of V2O5 thin films can be grown, ranging from amorphous to highly textured crystalline. Dense, phase-pure V2O5 thin films were grown on SnO2/glass substrates and amorphous quartz substrates by pulsed laser deposition over a wide range of temperatures and oxygen pressures. The films' microstructure, crystallinity, and texturing were characterized by electron microscopy, x-ray diffraction, and Raman spectroscopy. Temperature and oxygen pressure appeared to play more significant roles in the resulting crystallographic texture than did the choice of substrate. A growth map summarizes the results and delineates the temperature and O2 pressure window for growing dense, uniform, phase-pure V2O5 films.

Highly Conductive and Optically Transparent Polycrystalline Iridium Oxide Thin Films Grown by Reactive Pulsed Laser Deposition

1997 ◽  
Vol 472 ◽  
Author(s):  
M.A. El Khakani ◽  
M. Chaker
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Deposition Temperature ◽  
Room Temperature ◽  
Optical Transmission ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Structure Morphology ◽  
Quartz Substrates

ABSTRACTReactive pulsed laser deposition has been used to deposit IrO2 thin films on both SiO2 and fused quartz substrates, by ablating a metal iridium target in oxygen atmosphere. At a KrF laser intensity of about 1.7 × 109 W/cm2, IrO2 films were deposited at substrate deposition temperatures ranging from room-temperature to 700 °C under an optimum oxygen ambient pressure of 200 mTorr. The structure, morphology, electrical resistivity and optical transmission of the deposited films were characterized as a function of their deposition temperature (Td). High quality IrO2 films are obtained in the 400–600 °C deposition temperature range. They are polycrystalline with preferred orientations, depending on the substrate, and show a dense granular morphology. At a Td as low as 400 °C, highly conductive IrO2 films with room-temperature resistivities as low as (42±6) μΩ cm are obtained. Over the 300–600 °C Td range, the IrO2 films were found to exhibit a maximum optical transmission at 450 °C (∼ 45 % at 500 nm for 80 nm-thick films).

Large Third-Order Nonlinear Optical Susceptibility of Rh-Doped BaTiO 3 Thin Films Prepared by Pulsed Laser Deposition

2001 ◽  
Vol 18 (12) ◽  
pp. 1598-1600 ◽  
Author(s):  
Yang Guang ◽  
Wang Huan-Hua ◽  
Tan Guo-Tai ◽  
Jiang An-Quan ◽  
Zhou Yue-Liang ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Nonlinear Optical ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Third Order ◽  
Nonlinear Optical Susceptibility ◽  
Optical Susceptibility

Superconducting properties of YBCO thin films grown on [001] quartz substrates by pulsed laser deposition

2019 ◽  
Vol 562 ◽  
pp. 20-24 ◽  
Author(s):  
N.V. Porokhov ◽  
E.E. Levin ◽  
M.L. Chukharkin ◽  
A.S. Kalaboukhov ◽  
A.G. Maresov ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Superconducting Properties ◽  
Ybco Thin Films ◽  
Quartz Substrates
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