Self-heating and Negative Differential Conductance Improvement by Substrate Bias Voltage in Tri-gate Junctionless Transistor

Silicon ◽  
2021 ◽  
Author(s):  
Deepti Gola ◽  
Yograj Singh Duksh ◽  
Balraj Singh ◽  
Pramod Kumar Tiwari
Keyword(s):  
Bias Voltage ◽  
Differential Conductance ◽  
Substrate Bias ◽  
Negative Differential Conductance ◽  
Substrate Bias Voltage ◽  
Self Heating ◽  
Junctionless Transistor

Improvement of Zr film purity by using a purified sputtering target and negative substrate bias voltage

2006 ◽  
Vol 201 (3-4) ◽  
pp. 1899-1901 ◽  
Author(s):  
J.-W. Lim ◽  
J.W. Bae ◽  
Y.F. Zhu ◽  
S. Lee ◽  
K. Mimura ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Negative Substrate Bias

Influence of substrate bias voltage on the properties of sputtered nickel oxide thin films

2012 ◽  
Author(s):  
A. Mallikarjuna Reddy ◽  
Ch. Seshendra Reddy ◽  
Y. Ashok Kumar Reddy ◽  
R. Lydia ◽  
P. Sreedhara Reddy ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Oxide Thin Films ◽  
Substrate Bias Voltage ◽  
Influence Of Substrate ◽  
Nickel Oxide Thin Films

Effect of substrate bias voltage on the composition, microstructure and mechanical properties of W-B-C coatings

2020 ◽  
Vol 528 ◽  
pp. 146966
Author(s):  
S. Mirzaei ◽  
M. Alishahi ◽  
P. Souček ◽  
V. Buršíková ◽  
L. Zábranský ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Bias Voltage ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Microstructure And Mechanical Properties

Characterization of Bias Sputtered Aluminum Film

1986 ◽  
Vol 76 ◽  
Author(s):  
Y. Homma ◽  
K. Hinode ◽  
T. Terada
Keyword(s):  
Heat Treatment ◽  
Bias Voltage ◽  
Void Growth ◽  
Aluminum Film ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Film Characteristics ◽  
Negative Substrate Bias

ABSTRACTThe characteristics of RF bias-sputtered Al films are clarified. A negative substrate bias voltage, VDC, produced by RF biasing, strongly influences not only the planarization effect but also film characteristics such as hillock and void growth, and Ar content.Films deposited at VDc lower than -150 V. are significantly degraded due to the formation of two kinds of voids grown during annealing. One type is a blister-like voids, while the others are large and irregular. These are produced when Ar is released from the films during heat treatment. as evidenced by the fact that the amount of Ar released from the films rapidly increases when VDC is lower than -150 V.Although biasing strongly effects Al films resulting in the formation of an almost complete (111) texture. the effect degrades as VDC exceeds -200 V. Thus, Al bias sputtering requires a high resputtering rate and a VDC higher than -150 V to achieve appropriate planarization with suitable film characteristics.

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