Oxidation of Cu(I) by oxygen in concentrated NaCl solutions—I. Homogeneous kinetics of oxidation by molecular oxygen in solution

1985 ◽  
Vol 40 (8) ◽  
pp. 1527-1531 ◽  
Author(s):  
N. Papassiopi ◽  
A. Gaunand ◽  
H. Renon
1984 ◽  
Vol 92 (3) ◽  
pp. 177-180 ◽  
Author(s):  
R. Stevanato ◽  
E. Argese ◽  
P. Viglino ◽  
A. Rigo

1991 ◽  
Vol 230 ◽  
Author(s):  
K. Yamamoto ◽  
B. M. Lairson ◽  
J. C. Bravman ◽  
T. H. Geballe

AbstractThe kinetics of oxidation in Yba2Cu3O7-x thin films in the presence of molecular and atomic oxygen ambients have been studied. The resistivity of c-axis, a-axis, and mixed a+c axis oriented films, deposited in-situ by off-axis magnetron sputtering, was measured as a function of time subsequent to a change in the ambient conditions. The oxidation process is shown to be thermally activated and can be characterized by a diffusion model with an activation energy which varies from approximately 1.2eV in the presence of molecular oxygen to 0.6eV for a flux of 2×1015 oxygen atoms/cm2sec. In both cases, diffusivity is found to be insensitive to oxygen stoichiometry, but the rate of oxidation is found to be sensitive to the microstructure and orientation of the films.


1999 ◽  
Vol 54 (19) ◽  
pp. 4223-4232 ◽  
Author(s):  
M.R. Rönnholm ◽  
J. Wärnå ◽  
T. Salmi ◽  
I. Turunen ◽  
M. Luoma

2018 ◽  
Vol 225 ◽  
pp. 116-127 ◽  
Author(s):  
Jessica M. Wilson ◽  
Kevin J. Farley ◽  
Richard F. Carbonaro

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