Kinetics of oxidation of uranium(IV) in an organic medium by molecular oxygen

1975 ◽  
Vol 11 (5) ◽  
pp. 349-351 ◽  
Author(s):  
K. Južnič ◽  
M. Senegačnik
Keyword(s):  
Molecular Oxygen ◽  
Organic Medium ◽  
Kinetics Of Oxidation ◽  
Kinetics Of

The kinetics of oxidation of Cu(I) by molecular oxygen in aqueous pyridine

1984 ◽  
Vol 92 (3) ◽  
pp. 177-180 ◽  
Author(s):  
R. Stevanato ◽  
E. Argese ◽  
P. Viglino ◽  
A. Rigo
Keyword(s):  
Molecular Oxygen ◽  
Kinetics Of Oxidation ◽  
Kinetics Of

Oxidation Kinetics of Yba2Cu3OT7-x Thin Films in the Presence of Atomic Oxygen and Molecular Oxygen by In-Situ Resistivity Measurement

1991 ◽  
Vol 230 ◽  
Author(s):  
K. Yamamoto ◽  
B. M. Lairson ◽  
J. C. Bravman ◽  
T. H. Geballe
Keyword(s):  
Thin Films ◽  
Molecular Oxygen ◽  
Atomic Oxygen ◽  
Resistivity Measurement ◽  
Oxygen Stoichiometry ◽  
Ambient Conditions ◽  
Kinetics Of Oxidation ◽  
Thermally Activated ◽  
Kinetics Of

AbstractThe kinetics of oxidation in Yba2Cu3O7-x thin films in the presence of molecular and atomic oxygen ambients have been studied. The resistivity of c-axis, a-axis, and mixed a+c axis oriented films, deposited in-situ by off-axis magnetron sputtering, was measured as a function of time subsequent to a change in the ambient conditions. The oxidation process is shown to be thermally activated and can be characterized by a diffusion model with an activation energy which varies from approximately 1.2eV in the presence of molecular oxygen to 0.6eV for a flux of 2×1015 oxygen atoms/cm2sec. In both cases, diffusivity is found to be insensitive to oxygen stoichiometry, but the rate of oxidation is found to be sensitive to the microstructure and orientation of the films.

Kinetics of oxidation of ferrous sulfate with molecular oxygen

1999 ◽  
Vol 54 (19) ◽  
pp. 4223-4232 ◽  
Author(s):  
M.R. Rönnholm ◽  
J. Wärnå ◽  
T. Salmi ◽  
I. Turunen ◽  
M. Luoma
Keyword(s):  
Molecular Oxygen ◽  
Ferrous Sulfate ◽  
Kinetics Of Oxidation ◽  
Kinetics Of

scholarly journals The Effect of Hydrazide Group on the Oxydation of Ferrocene at Two Different Electrodes Using Rotating Disk Electrode (RDE) in Organic Medium

2013 ◽  
Vol 12 ◽  
pp. 1-7
Author(s):  
Salah Neghmouche Nacer ◽  
Touhami Lanez
Keyword(s):  
Rotating Disk ◽  
Electrochemical Stability ◽  
Organic Medium ◽  
Rotating Disk Electrode ◽  
Electrochemical System ◽  
Disk Electrode ◽  
Electron Transfer Rate ◽  
Kinetics Of Oxidation ◽  
Electrochemical Parameters ◽  
Kinetics Of

Through this work we adopted Rotating Disk Electrode (RDE) Voltammetry to study the kinetics of oxidation and the effect of hydrazide group on ferrocene in organic medium. Thus, two different electrodes (Pt and Ge) were used in order to determine this latter. According to the ferrocene taken as a witness the hydrazide group related to the ferrocene made oxidation more difficult. This ferrocenic derivative showed an electrochemical stability, a reversible electrochemical system and an electronic attractor effect of these substitutional ferrocene groups. Finally, we calculated some electrochemical parameters which were: the diffusion coefficients (D), the layer thickness ‹δ› in addition to the electron transfer rate.

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