Kinetics of oxidation of copper(I) by molecular oxygen in perchloric acid-acetonitrile solutions

1969 ◽  
Vol 91 (1) ◽  
pp. 56-62 ◽  
Author(s):  
Robert D. Gray
Keyword(s):  
Molecular Oxygen ◽  
Perchloric Acid ◽  
Kinetics Of Oxidation ◽  
Acetonitrile Solutions ◽  
Kinetics Of

A KINETICS AND MECHANISTIC STUDY OF THE OXIDATION OF L-ARGININE BY QDC IN DMF-WATER MEDIUM

2021 ◽  
pp. 11-12
Author(s):  
Deepika Jain ◽  
Shilpa Rathor
Keyword(s):  
Perchloric Acid ◽  
Reaction Rate ◽  
Main Product ◽  
Activation Parameters ◽  
Reaction Rates ◽  
Mechanistic Study ◽  
Water Medium ◽  
Volume Percentage ◽  
Kinetics Of Oxidation ◽  
Kinetics Of

The present paper describes the kinetics of oxidation of l-Arginine by QDC in the presence of perchloric acid in 30% DMF-H O(v/v) medium at 2 + 40⁰C spectrophotometrically at λ =354nm. The reaction is rst order with respect to [QDC], [H ], and [substrate]. The reaction rate increased with max increasing volume percentage of DMF in reaction mixture. Michaelis- Menten type kinetic was observed with l-Arginine. The reaction rates were studied at different temperature and the activation parameters has been computed. The main product was identied as Cr (III) and 4-Guanidino buteraldehyde.

The kinetics of oxidation of Cu(I) by molecular oxygen in aqueous pyridine

1984 ◽  
Vol 92 (3) ◽  
pp. 177-180 ◽  
Author(s):  
R. Stevanato ◽  
E. Argese ◽  
P. Viglino ◽  
A. Rigo
Keyword(s):  
Molecular Oxygen ◽  
Kinetics Of Oxidation ◽  
Kinetics Of

KINETICS OF THE OXIDATION OF URANIUM (IV) BY IRON (III) IN AQUEOUS SOLUTIONS OF PERCHLORIC ACID

1955 ◽  
Vol 33 (12) ◽  
pp. 1780-1791 ◽  
Author(s):  
R. H. Betts
Keyword(s):  
Electron Transfer ◽  
Ionic Strength ◽  
Aqueous Solutions ◽  
Perchloric Acid ◽  
Rate Constants ◽  
Kcal Mole ◽  
Kinetics Of Oxidation ◽  
Temperature Coefficients ◽  
Kinetics Of ◽  
Rate Controlling Step

The kinetics of oxidation of uranium (IV) by iron (III) in aqueous solutions of perchloric acid have been investigated at four temperatures between 3.1 °C. and 24.8 °C. The reaction was followed by measurement of the amount of ferrous ion formed. For the conditions (H+) = 0.1–1.0 M, ionic strength = 1.02, (FeIII) = 10−4–10−5 M, and (UIV) = 10−4–10−5 M, the observed rate law is d(Fe2+)/dt = −2d(UIV)/dt[Formula: see text]K1 and K2 are the first hydrolysis constants for Fe3+ and U4+, respectively, and K′ and K″ are pseudo rate constants. At 24.8 °C., K′ = 2.98 sec.−1, and K″ = 10.6 mole liter−1 sec−1. The corresponding temperature coefficients are ΔH′ = 22.5 kcal./mole and ΔH″ = 24.2 kcal./mole. The kinetics of the process are consistent with a mechanism which involves, as a rate-controlling step, electron transfer between hydrolyzed ions.

Kinetics of oxidation of hypophosphitopentamminechromium(III) ion with periodate

1981 ◽  
Vol 46 (10) ◽  
pp. 2503-2508 ◽  
Author(s):  
Olga Volárová ◽  
Vladislav Holba
Keyword(s):  
Ionic Strength ◽  
Oxygen Atom ◽  
Perchloric Acid ◽  
Redox Reaction ◽  
Reaction Rate ◽  
Kinetics Of Oxidation ◽  
Kinetics Of

The kinetics of oxidation of hypophosphitopentamminechromium(III) ion with periodate was investigated as a function of the temperature, ionic strength, and concentration of perchloric acid. The reaction rate decreased with increasing ionic strength and concentration of perchloric acid. The redox reaction proper involving transfer of an oxygen atom is preceded by dissociation of hydrogen from the coordinated hypophosphite. The reactivity of the latter is compared with that of the free hypophosphite.

Oxidation Kinetics of Yba2Cu3OT7-x Thin Films in the Presence of Atomic Oxygen and Molecular Oxygen by In-Situ Resistivity Measurement

1991 ◽  
Vol 230 ◽  
Author(s):  
K. Yamamoto ◽  
B. M. Lairson ◽  
J. C. Bravman ◽  
T. H. Geballe
Keyword(s):  
Thin Films ◽  
Molecular Oxygen ◽  
Atomic Oxygen ◽  
Resistivity Measurement ◽  
Oxygen Stoichiometry ◽  
Ambient Conditions ◽  
Kinetics Of Oxidation ◽  
Thermally Activated ◽  
Kinetics Of

AbstractThe kinetics of oxidation in Yba2Cu3O7-x thin films in the presence of molecular and atomic oxygen ambients have been studied. The resistivity of c-axis, a-axis, and mixed a+c axis oriented films, deposited in-situ by off-axis magnetron sputtering, was measured as a function of time subsequent to a change in the ambient conditions. The oxidation process is shown to be thermally activated and can be characterized by a diffusion model with an activation energy which varies from approximately 1.2eV in the presence of molecular oxygen to 0.6eV for a flux of 2×1015 oxygen atoms/cm2sec. In both cases, diffusivity is found to be insensitive to oxygen stoichiometry, but the rate of oxidation is found to be sensitive to the microstructure and orientation of the films.

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