Field-effect transistors based on intrinsic molecular semiconductors

1990 ◽  
Vol 167 (6) ◽  
pp. 503-506 ◽  
Author(s):  
Gérard Guillaud ◽  
Manaa Al Sadoun ◽  
Monique Maitrot ◽  
Jacques Simon ◽  
Marcel Bouvet
2017 ◽  
Vol 5 (30) ◽  
pp. 7404-7430 ◽  
Author(s):  
Joydeep Dhar ◽  
Ulrike Salzner ◽  
Satish Patil

This review highlights recent advancement in developing ambient stable organic molecular semiconductors from the theoretical and experimental perspectives.


2017 ◽  
Vol 5 (9) ◽  
pp. 2368-2379 ◽  
Author(s):  
Resul Ozdemir ◽  
Donghee Choi ◽  
Mehmet Ozdemir ◽  
Guhyun Kwon ◽  
Hyekyoung Kim ◽  
...  

New ultralow bandgap semiconductor small molecules were designed and synthesized for ambient-stable and solution-processable ambipolar organic field-effect transistors and high-gain inverters.


2015 ◽  
Vol 3 (17) ◽  
pp. 4244-4249 ◽  
Author(s):  
Jian-Yong Hu ◽  
Masahiro Nakano ◽  
Itaru Osaka ◽  
Kazuo Takimiya

We report new NDTI-based triad-type ambipolar molecular semiconductors for high-performance air-stable, solution-processed OFETs and complementary-like inverters.


2021 ◽  
Vol 21 (7) ◽  
pp. 3923-3928
Author(s):  
Gyujeong Lee ◽  
Hea-Lim Park ◽  
Sin-Hyung Lee ◽  
Min-Hoi Kim ◽  
Sin-Doo Lee

We investigate the effect of a semiconducting organic buffer layer (SOBL) on the injection and transport of charges in organic field-effect transistors (OFETs). Here, two different injection barriers at the source/organic semiconductor interface are respectively studied with the aid of a numerical simulation: one is intermediate (0.4 eV), and the other is large energy barriers (0.6 eV). The introduction of nanostructure buffer layer, or SOBL, exhibits the decrease of potential loss at the contact interfaces, improving the electrical performance of the OFETs. It is also found that the energy level as well as the mobility of the SOBL plays an important role in determining the injection properties at the metal/organic hetero-interfaces and thus improving the device performance. Our systematic investigation on the injection barrier by the introduction of the nanostructure buffer layer will provide a useful guideline for the fabrication of high-performance FETs with molecular semiconductors.


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